Research output per year
Research output per year
- 10 results
Search results
-
2011
ALD from emerging applications to industrial production: selected examples beyond IC technology
Putkonen, M., 2011Research output: Book/Report › Commissioned report
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Industrial ALD Equipment for PV and OLED Applications
Putkonen, M., 2011Research output: Book/Report › Commissioned report
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Pushing the limits of plasma ALD conformality
Putkonen, M., Kariniemi, M., Niinistö, J., Vehkamäki, M., Kemell, M., Ritala, M., Leskelä, M., Karwacki, E. J. & Buchanan, I., 2011Research output: Book/Report › Commissioned report
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2009
ALD for amino-functionalization of silicon surfaces using aminoalkoxysilanes and water
Malm, J., Putkonen, M. & Karppinen, M., 2009Research output: Book/Report › Commissioned report
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ALD of WO3 thin films on Si(100) surfaces from W(CO)6 and O3 precursors
Malm, J., Putkonen, M. & Karppinen, M., 2009Research output: Book/Report › Commissioned report
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Beneq Oy, University of Jyväskylä and University of Helsinki Effects of ALD TiN on the Abrasion Resistance of Three Stainless Steel Grades
Malinen, V., Putkonen, M., Sajavaara, T., Kemell, M., Puukilainen, E., Ritala, M. & Leskelä, M., 2009Research output: Book/Report › Commissioned report
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2006
ALD of HfO2 using a new organometallic Hf precursor, The AVS Topical Conference on Atomic Layer Deposition (ALD 2006)
Jones, A. C., O’Kane, R., Song, F., Heys, P., Williams, P. A., Niinistö, L., Niinistö, J., Putkonen, M., Hammond, R. & Bacon, A., 2006Research output: Book/Report › Commissioned report
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2004
Comparison of HfO2 Thin Films Grown by ALD Using Cp2Hf(CH3)2 and Water or Ozone as Precursors
Niinistö, J., Putkonen, M. & Niinistö, L., 2004Research output: Book/Report › Commissioned report
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Reaction Mechanism Studies on ZrO2 Grown by ALD - A Comparison Between ZrCl4 and Cp2ZrMe2 Based Processes
Rahtu, A., Niinistö, J., Putkonen, M., Niinistö, L., Ritala, M. & Leskelä, M., 2004Research output: Book/Report › Commissioned report
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2003
Microstructural and electrical properties of gadolinium doped ceria thin films prepared by atomic layer deposition (ALD)
Gourba, E., Ringuedé, A., Cassir, M., Päiväsaari, J., Niinistö, J., Putkonen, M. & Niinistö, L., 2003Research output: Book/Report › Commissioned report