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Publications 1994 2019

Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Films

Väyrynen, K., Hatanpää, T., Mattinen, M., Mizohata, K., Meinander, K., Räisänen, J., Link, J., Stern, R., Ritala, M. & Leskela, M., Feb 2019, In : Advanced Materials Interfaces . 6, 3, 7 p., 1801291.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of PbI₂ Thin Films

Popov, G., Mattinen, M. J., Hatanpää, T., Vehkamäki, M., Kemell, M., Mizohata, K., Räisänen, J., Ritala, M. & Leskelä, M., 12 Feb 2019, In : Chemistry of Materials. 31, 3, p. 1101–1109 9 p.

Research output: Contribution to journalArticleScientificpeer-review

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Charge carrier dynamics in tantalum oxide overlayered and tantalum doped hematite photoanodes

Ruoko, T-P., Hiltunen, A., Iivonen, T., Ulkuniemi, R., Lahtonen, K., Ali-Löytty, H., Mizohata, K., Valden, M., Leskelä, M. & Tkachenko, N. V., 21 Feb 2019, In : Journal of Materials Chemistry. A. 7, 7, p. 3206-3215 10 p.

Research output: Contribution to journalArticleScientificpeer-review

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Open Access
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Titania Nanotubes/Hydroxyapatite Nanocomposites Produced with the Use of the Atomic Layer Deposition Technique: Estimation of Bioactivity and Nanomechanical Properties

Radtke, A., Ehlert, M., Jcdrzejewski, T., Sadowska, B., Wieckowska-Szakiel, M., Holopainen, J., Ritala, M., Leskelä, M., Bartmanski, M., Szkodo, M. & Piszczek, P., Jan 2019, In : Nanomaterials. 9, 1, 21 p., 123.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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2018

Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

Kukli, K., Kemell, M., Castan, H., Duenas, S., Seemen, H., Rähn, M., Link, J., Stern, R., Heikkilä, M. J., Ritala, M. & Leskelä, M., 2018, In : ECS Journal of Solid State Science and Technology. 7, 5, p. P287-P294 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

Kukli, K., Kemell, M., Castan, H., Duenas, S., Seemen, H., Rähn, M., Link, J., Stern, R., Ritala, M. & Leskelä, M., 6 Sep 2018, In : ECS Journal of Solid State Science and Technology. 7, 9, p. P501-P508 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

Mattinen, M., King, P. J., Khriachtchev, L., Heikkilä, M. J., Fleming, B., Rushworth, S., Mizohata, K., Meinander, K., Räisänen, J., Ritala, M. & Leskelä, M., Sep 2018, In : Materials today chemistry. 9, p. 17-27 11 p.

Research output: Contribution to journalArticleScientificpeer-review

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Atomic layer deposition of lanthanum oxide with heteroleptic cyclopentadienyl-amidinate lanthanum precursor - Effect of the oxygen source on the film growth and properties

Seppälä, S., Niinistö, J., Mattinen, M., Mizohata, K., Räisänen, J., Noh, W., Ritala, M. & Leskelä, M., 30 Aug 2018, In : Thin Solid Films. 660, p. 199-206 8 p.

Research output: Contribution to journalArticleScientificpeer-review

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Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties

Mattinen, M., Wree, J-L., Stegmann, N., Ciftyurek, E., El Achhab, M., King, P. J., Mizohata, K., Räisänen, J., Schierbaum, K. D., Devi, A., Ritala, M. & Leskelä, M., 11 Dec 2018, In : Chemistry of Materials. 30, 23, p. 8690-8701 12 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Rhenium Disulfide

Hämäläinen, J., Mattinen, M., Mizohata, K., Meinander, K., Vehkamäki, M., Räisänen, J., Ritala, M. & Leskelä, M., 13 Jun 2018, In : Advanced Materials. 30, 24, p. 1703622 6 p., 1703622.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone

Kukli, K., Kemell, M., Mizohata, K., Vehkamäki, M., Kalam, K., Castan, H., Duenas, S., Link, J., Stern, R., Ritala, M. & Leskelä, M., 2018, In : ECS Journal of Solid State Science and Technology. 7, 2, p. P1-P8 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Design aspects of all atomic layer deposited TiO2–Fe2O3 scaffold-absorber photoanodes for water splitting

Hiltunen, A., Ruoko, T-P., Iivonen, T., Lahtonen, K., Ali-Löytty, H., Sarlin, E., Valden, M., Leskelä, M. & Tkachenko, N., 1 Sep 2018, In : Sustainable Energy & Fuels. 2, 9, p. 2124-2130 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films

Mattinen, M., King, P. J., Khriachtchev, L., Meinander, K., Gibbon, J. T., Dhanak, V. R., Räisänen, J., Ritala, M. & Leskelä, M., 24 May 2018, In : Small. 14, 21, 8 p., 1800547.

Research output: Contribution to journalArticleScientificpeer-review

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Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Mäntymäki, M., Ritala, M. & Leskelä, M., 8 Aug 2018, In : Coatings. 8, 8, 40 p., 277.

Research output: Contribution to journalReview ArticleScientificpeer-review

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Metal oxide multilayer hard mask system for 3D nanofabrication

Han, Z., Vehkamäki, M., Salmi, E., Leskelä, M. & Ritala, M., 2 Feb 2018, In : Nanotechnology. 29, 5, 8 p., 055301.

Research output: Contribution to journalArticleScientificpeer-review

Patterned films by atomic layer deposition using Parafilm as a mask

Zhang, C., Kalliomäki, J., Leskelä, M. & Ritala, M., Jan 2018, In : Journal of vacuum science & technology : an official journal of the American Vacuum Society. 36, 1, 5 p., ARTN 01B102.

Research output: Contribution to journalArticleScientificpeer-review

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

Hämäläinen, J., Mizohata, K., Meinander, K., Mattinen, M., Vehkamäki, M., Räisänen, J., Ritala, M. & Leskelä, M., 26 Oct 2018, In : Angewandte Chemie (International Edition). 57, 44, p. 14538-14542 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Study of the influence of the dielectric composition of Al/Ti/ZrO2:Al2O3/TiN/Si/Al structures on the resistive switching behavior for memory applications

Castán, H., Dueñas, S., Kukli, K., Kemell, M., Ritala, M. & Leskelä, M., 2018, In : ECS transactions. 85, 8, p. 143-148 6 p.

Research output: Contribution to journalConference articleScientificpeer-review

Tekniikan kemia

Hänninen, H., Karppinen, M., Leskelä, M. A. & Pohjakallio, M., 2018, 14. uudistettu painos ed. Helsinki: Edita. 420 p.

Research output: Book/ReportBookProfessional

Towards space-grade 3D-printed, ALD-coated small satellite propulsion components for fluidics

Kestilä, A., Nordling, K. G. M., Miikkulainen, V., Kaipio, M., Tikka, T., Salmi, M., Auer, A., Leskelä, M. & Ritala, M., Aug 2018, In : Additive manufacturing. 22, p. 31-37 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Admittance memory cycles of Ta2O5-ZrO2-based RRAM devices

Duenas, S., Castan, H., Ossorio, O. G., Dominguez, L. A., Gracia, H., Kalam, K., Kukli, K., Ritala, M. & Leskelä, M., 2017, 2017 32ND CONFERENCE ON DESIGN OF CIRCUITS AND INTEGRATED SYSTEMS (DCIS). IEEE, 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposited protective layers

Leskelä, M., Salmi, E. & Ritala, M., 2017, In : Materials Science Forum. 879, p. 1086-1092 7 p.

Research output: Contribution to journalConference articleScientificpeer-review

Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films

Kukli, K., Kemell, M., Vehkamäki, M., Heikkilä, M. J., Mizohata, K., Kalam, K., Ritala, M., Leskelä, M., Kundrata, I. & Frohlich, K., Feb 2017, In : AIP Advances. 7, 2, 15 p., 025001.

Research output: Contribution to journalArticleScientificpeer-review

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Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth

Mattinen, M., Hatanpaa, T., Sarnet, T., Mizohata, K., Meinander, K., King, P. J., Khriachtchev, L., Räisänen, J., Ritala, M. & Leskelä, M., 22 Sep 2017, In : Advanced Materials Interfaces . 4, 18, 11 p., 1700123.

Research output: Contribution to journalArticleScientificpeer-review

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Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices

Kim, J., Iivonen, T., Hämäläinen, J., Kemell, M., Meinander, K., Mizohata, K., Wang, L., Räisänen, J., Beranek, R., Leskelä, M. & Devi, A., 25 Jul 2017, In : Chemistry of Materials. 29, 14, p. 5796-5805 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)(2) and Tertiary Butyl Hydrazine

Väyrynen, K., Mizohata, K., Räisänen, J., Peeters, D., Devi, A., Ritala, M. & Leskelä, M., 8 Aug 2017, In : Chemistry of Materials. 29, 15, p. 6502-6510 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings

Radtke, A., Jędrzejewski, T., Kozak, W., Sadowska, B., Więckowska-Szakiel, M., Talik, E., Mäkelä, M. I., Leskelä, M. A. & Piszczek, P., 24 Jul 2017, In : Nanomaterials. 7, 7, 19 p., 193.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films

Atosuo, E., Mäntymäki, M., Mizohata, K., Heikkilä, M. J., Räisänen, J., Ritala, M. & Leskelä, M., 14 Feb 2017, In : Chemistry of Materials. 29, 3, p. 998-1005 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S-H., Kallio, T., Kanervo, J. & 42 othersKhmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kaerkkaenen, I., Kaariainen, M-L., Kääriäinen, T., Lamagna, L., Lapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Ozgit-Akgun, C., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Torndahl, T., van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 2017, In : Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films. 35, 1, 13 p., 010801.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access

Standardized Procedures Important for Improving Single-Component Ceramic Fuel Cell Technology

Lund, P. D., Zhu, B., Li, Y., Yun, S., Nasibulin, A. G., Raza, R., Leskelä, M., Ni, M., Wu, Y., Chen, G., Fan, L., Kim, J-S., Basu, S., Kallio, T. & Pamuk, I., Dec 2017, In : ACS Energy Letters. 2, 12, p. 2752-2755 4 p.

Research output: Contribution to journalLetterScientificpeer-review

Studies on Li3AlF6 thin film deposition utilizing conversion reactions of thin films

Mäntymäki, M. J., Mizohata, K., Heikkilä, M. J., Räisänen, J. A., Ritala, M. K. & Leskelä, M. A., 2017, In : Thin Solid Films. 636, p. 26-33 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Studies on Thermal Atomic Layer Deposition of Silver Thin Films

Mäkelä, M., Hatanpää, T., Mizohata, K., Meinander, K., Niinistö, J., Räisänen, J., Ritala, M. & Leskelä, M., 14 Mar 2017, In : Chemistry of Materials. 29, 5, p. 2040-2045 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Surface Modification of Acetaminophen Particles by Atomic Layer Deposition

Kääriäinen, T. O., Kemell, M. L., Vehkamäki, M. J., Kääriäinen, M-L., Correia, A., Almeida Santos, H., Marques dos Santos Bimbo, L. M., Hirvonen, J. T., Hoppu, P., George, S. M., Cameron, D. C., Ritala, M. K. & Leskelä, M. A., 15 Jun 2017, In : International Journal of Pharmaceutics. 525, 1, p. 160–174 15 p.

Research output: Contribution to journalArticleScientificpeer-review

Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films

Mäkelä, M. I., Hatanpää, T. T., Mizohata, K., Räisänen, J. A., Ritala, M. K. & Leskelä, M. A., 27 Jun 2017, In : Chemistry of Materials. 29, 14, p. 6130–6136 7 p.

Research output: Contribution to journalArticleScientificpeer-review

2016

Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)(3)As through the GaAs process

Sarnet, T., Hatanpää, T., Laitinen, M., Sajavaara, T., Mizohata, K., Ritala, M. & Leskelä, M., 2016, In : Journal of Materials Chemistry. C. 4, 3, p. 449-454 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of aluminum fluoride thin films

Mäntymäki, M., Ritala, M. & Leskelä, M., 19 Jul 2016, Patent No. US 9,394,609 B2, 19 Jul 2016

Research output: PatentScientific

Atomic layer deposition of aluminum oxide on modified steel substrates

Kukli, K., Salmi, E., Jogiaas, T., Zabels, R., Schuisky, M., Westlinder, J., Mizohata, K., Ritala, M. & Leskelä, M., 25 Oct 2016, In : Surface & Coatings Technology. 304, p. 1-8 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses

Mattinen, M., Hämäläinen, J., Vehkamäki, M., Heikkilä, M. J., Mizohata, K., Jalkanen, P., Räisänen, J., Ritala, M. & Leskelä, M., 21 Jul 2016, In : Journal of Physical Chemistry C. 120, 28, p. 15235-15243 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Metal Phosphates and Lithium Silicates

Hamalainen, J., Holopainen, J., Hatanpaa, T., Ritala, M. & Leskela, M., 19 Apr 2016, Patent No. US9315894 B2, 19 Apr 2016

Research output: PatentScientific