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Publications 1994 2019

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Review Article
2018

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Mäntymäki, M., Ritala, M. & Leskelä, M., 8 Aug 2018, In : Coatings. 8, 8, 40 p., 277.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
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2017

Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S-H., Kallio, T., Kanervo, J. & 42 othersKhmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kaerkkaenen, I., Kaariainen, M-L., Kääriäinen, T., Lamagna, L., Lapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Ozgit-Akgun, C., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Torndahl, T., van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 2017, In : Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films. 35, 1, 13 p., 010801.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
2014

Atomic Layer Deposition of Noble Metals and Their Oxides

Hämäläinen, J., Ritala, M. & Leskelä, M., 2014, In : Chemistry of Materials. 26, 1, p. 786-801 16 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2012

Double metal alkoxides of lithium: Synthesis, structure and applications in materials chemistry

Mäntymäki, M., Ritala, M. & Leskelä, M., 2012, In : Coordination Chemistry Reviews. 256, 9-10, p. 854-877 24 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2009

Atomic layer deposition of high-k oxides of the group 4 metals for memory applications

Niinistö, J., Kukli, K., Heikkilä, M., Ritala, M. & Leskelä, M., 2009, In : Advanced Engineering Materials. 11, 4, p. 223-234 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Solid state nanofibers based on self-assemblies: from cleaving from self-assemblies to multilevel hierarchical constructs

Ikkala, O., Ras, R. H. A., Houbenov, N., Ruokolainen, J., Pääkkö, M., Laine, J., Leskelä, M. & Berglund, L. A., 2009, In : Faraday Discussions. 143, p. 95-107 13 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Teaching high-temperature materials chemistry at university

Balduccii, G., Ciccioli, A., De Maria, G., Hodaj, F., Rosenblatt, G. M. & Leskelä, M., 2009, In : Pure and Applied Chemistry. 81, p. 299-338 40 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2007

Exploitation of atomic layer deposition for nanostructured materials

Leskelä, M., Kemell, M., Kukli, K., Pore, V., Santala, E., Lu, J. & Ritala, M., 2007, In : Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems. 27, p. 1504-1508 5 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2006

Rare-earth oxide thin films for gate dielectrics in microelectronics

Leskelä, M., Kukli, K. & Ritala, M., 2006, In : Journal of Alloys and Compounds. 418, 1-2, p. 27-34 8 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2005

Thin film deposition methods for CulnSe(2) solar cells

Kemell, M., Ritala, M. & Leskelä, M., 2005, In : Critical Reviews in Solid State & Materials Sciences. 30, 1, p. 1-31 31 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2004

Some recent developments in the MOCVD and ALD of high-kappa dielectric oxides

Jones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Kukli, K., Rahtu, A., Ritala, M. & Leskelä, M., 2004, In : Journal of Materials Chemistry. 14, p. 3101-3112 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2003

Rare-earth oxide thin films as gate oxides in MOSFET transistors

Leskelä, M. & Ritala, M., 2003, In : Journal of Solid State Chemistry. 171, p. 170-174 5 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2002

Atomic layer deposition (ALD): from precursors to thin film structures

Leskelä, M. & Ritala, M., 2002, In : Thin Solid Films. 409, 1, p. 138-146 9 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1999

ALD precursor chemistry: Evolution and future challenges

Leskelä, M. & Ritala, M., 1999, In : Journal de physique. IV. 9, p. 837-852 16 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Atomic layer epitaxy - a valuable tool for nanotechnology?

Ritala, M. & Leskelä, M., 1999, In : Nanotechnology. 10, p. 19-24 6 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1998

Rare Earths in electroluminescent and field emission displays

Leskelä, M., 1998, In : Journal of Alloys and Compounds. 275-277, p. 702-708. 7 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1996

Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications

Niinistö, L., Ritala, M. & Leskelä, M., 1996, In : Materials Science and Engineering B: Advanced Functional Solid-state Materials. 41, p. 23-29 7 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1995

ATOMIC LAYER EPITAXY IN DEPOSITION OF VARIOUS OXIDE AND NITRIDE THIN-FILMS

Leskelä, M. & Ritala, M., 1995, In : Journal de physique. IV. 5, p. 937-951 15 p.

Research output: Contribution to journalReview ArticleScientificpeer-review