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Publications 1991 2019

2007

Zone-doubling technique to produce ultrahigh-resolution x-ray optics

Jefimovs, K., Vila-Comamala, J., Pilvi, T., Raabe, J., Ritala, M. & David, C., 2007, In : Physical Review Letters. 99, 26, p. art no 264801 4 p.

Research output: Contribution to journalArticleScientificpeer-review

2006

Antifouling properties of TiO2: Photocatalytic decomposition and adhesion of fatty and rosin acids, sterols and lipophilic wood extractives

Kallio, T., Alajoki, S., Pore, V., Ritala, M., Laine, J., Leskelä, M. & Stenius, P., 2006, In : Colloids and Surfaces A: Physicochemical and Engineering Aspects. 291, 1-3, p. 162-176 15 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition and properties of lanthanum oxide and lanthanum-aluminum oxide films

Kukli, K., Ritala, M., Pore, V., Leskelä, M., Sajavaara, T., Hegde, R. I., Gilmer, D. C., Tobin, P. J., Jones, A. C. & Aspinall, H. C., 2006, In : Chemical Vapor Deposition. 12, p. 158-164 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of calcium oxide and calcium hafnium oxide films using calcium cyclopentadienyl precursor

Kukli, K., Ritala, M., Sajavaara, T., Hänninen, T. P. & Leskelä, M., 3 Apr 2006, In : Thin Solid Films. 500, 1-2, p. 322-329 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of calcium oxide and calcium halfnium oxide films using calcium cyclopentadienyl precursor

Kukli, K., Ritala, M., Sajavaara, T., Hänninen, T. & Leskelä, M., 2006, In : Thin Solid Films. 500, p. 322-329 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of ferroelectric bismuth titanate Bi4Ti3O12 thin films

Vehkamäki, M., Hatanpää, T., Kemell, M., Ritala, M. & Leskelä, M., 2006, In : Chemistry of Materials. 18, p. 3883-3888 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of TiO2-xNx thin films for photocatalytic applications

Pore, V., Heikkilä, M., Ritala, M., Leskelä, M. & Areva, S., 2006, In : Journal of Photochemistry and Photobiology, A: Chemistry. 177, 1, p. 68-75 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Characterisation of the Al2O3 films deposited by ultrasonic spray pyrolysis and atomic layer deposition methods for passivation of 4H-SiC devices

Wolborski, M., Bakowski, M., Ortiz, A., Pore, V., Schöner, A., Ritala, M., Leskelä, M. & Hallen, A., 2006, In : Microelectronics Reliability. 46, p. 743-755 13 p.

Research output: Contribution to journalArticleScientificpeer-review

Destruction of Deinococcus Geothermalis Biofilm by Photocatalytic ALD and Sol-Gel TiO2 Surfaces

Raulio, M., Pore, V., Areva, S., Ritala, M., Leskelä, M., Lindén, M., Rosenholm, J. B., Lounatmaa, K. & Salkinoja-Salonen, M., 2006, In : Journal of Industrial Microbiology and Biotechnology. 33, 4, p. 261-268 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Diffusion Barrier Properties of Atomic Layer Deposited Ultrathin Ta2O5 and TiO2 Films

Alen, P., Vehkamäki, M., Ritala, M. & Leskelä, M., 2006, In : Journal of the Electrochemical Society. 153, 4, p. G304-G308

Research output: Contribution to journalArticleScientificpeer-review

Disordered Structure and Density of Gap States in High-Permittivity Thin Solid Films

Kukli, K., Dueñas, S., Castán, H., Garcia, H., Barbolla, J., Aarik, J., Aidla, A., Ritala, M. & Leskelä, M., 2006, Defects in High-k Gate Dielectric Stacks: Nano-Electronic Semiconductor Devices. Gusev, E. (ed.). Springer, p. 123-134 12 p. (NATO Science Series II. Mathematics, Physcis and Chemistry; vol. 220).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Electrical Defects in Atomic Layer Deposited HfO2 Films on Silicon: Influence of Precursor Chemistries and Substrate Treatment

Dueñas, S., Castán, H., Garcia, H., Bailón, L., Kukli, K., Ritala, M. & Leskelä, M., 2006, NATO Science Series II : Mathematics, Physics and Chemistry . Vol. 220. p. 287-298

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Electrodeposition of Cu on Ru barrier layers for damascene processing

Moffat, T. P., Walker, M., Chen, P. J., Bonevich, J. E., Egelhoff, W. F., Richter, L., Witt, C., Aaltonen, T., Ritala, M., Leskelä, M. & Josell, D., 2006, In : Journal of the Electrochemical Society. 153, 1, p. C37-C50 14 p.

Research output: Contribution to journalArticleScientificpeer-review

Experimental investigation of the electrical properties of atomic layer deposition halfnium-rich silicate films on n-type silicon

Duenas, S., Castan, H., Garcia, H., Bailon, L., Kukli, K., Ritala, M., Leskelä, M., Rooth, M., Wilhelmsson, O. & Håsta, A., 2006, In : Journal of Applied Physics. 100, 9, p. art. 094107

Research output: Contribution to journalArticleScientificpeer-review

Free-standing inductive grid filter for infrared radiation rejection

Jefimovs, K., Laukkanen, J., Vallius, T., Pilvi, T., Ritala, M., Meilahti, T., Kaipainen, M., Bavdaz, M., Leskelä, M. & Turunen, J., 2006, In : Microelectronic Engineering. 83, p. 1339-1342 4 p.

Research output: Contribution to journalArticleScientificpeer-review

HfO2 films grown by ALD using cyclopentadienyl-type precursors and H2O or O-3 as oxygen source

Niinistö, J., Putkonen, M., Niinistö, L., Arstila, K., Sajavaara, T., Lu, J., Kukli, K., Ritala, M. & Leskelä, M., 2006, In : Journal of the Electrochemical Society. 153, 3, p. F39-F45 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films

Kukli, K., Ritala, M. & Leskelä, M., 2006, New Materials and Processes for Incoming Semiconductor Technologies. Dueñas, S. & Castán, H. (eds.). Trivandrum, Kerala, India: Transworld Research Network, p. 1-40

Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

Ir/Oxide/Cellulose composites for catalytic purposes prepared by atomic layer deposition

Kemell, M., Pore, V., Ritala, M. & Leskelä, M., 2006, In : Chemical Vapor Deposition. 12, 7, p. 419-422 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Iridium barriers for direct copper electrodeposition in damascene processing

Josell, D., Bonevich, J. E., Moffat, T. P., Aaltonen, T., Ritala, M. & Leskelä, M., 2006, In : Electrochemical and Solid-State Letters. 9, 2, p. C48-C50 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Quantum dot manipulation in a single-walled carbon nanotube using nanotube gate

Lee, D. S., Park, S. J., Park, S. D., Park, Y. W., Kemell, M., Ritala, M., Svensson, J., Jonson, M. & Campbell, E. E. B., 2006, In : Applied Physics Letters. 89, p. art no 233107 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Rapid coating of through-porous substrates by atomic layer deposition

Ritala, M., Kemell, M., Lautala, M., Niskanen, A., Leskelä, M. & Lindfors, S., 2006, In : Chemical Vapor Deposition. 12, 11, p. 655-658 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Rare-earth oxide thin films for gate dielecrics in microelectronics

Leskelä, M., Kukli, K. & Ritala, M., 2006, In : Journal of Alloys and Compounds. 418, p. 27-34 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Rare-earth oxide thin films for gate dielectrics in microelectronics

Leskelä, M., Kukli, K. & Ritala, M., 2006, In : Journal of Alloys and Compounds. 418, 1-2, p. 27-34 8 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Scale-up of the barium titanate atomic layer deposition process onto 200 MM wafer

Matero, R., Rahtu, A., Haukka, S., Tuominen, M., Vehkamäki, M., Hatanpää, T., Ritala, M. & Leskelä, M., 2006, In : ECS transactions. 1, 10, p. 137-141 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Self-assembled octadecyltrimethoxysilane monolayers enabling selective-area atomic layer deposition of iridium

Färm, E., Kemell, M., Ritala, M. & Leskelä, M., 2006, In : Chemical Vapor Deposition. 12, 7, p. 415-417 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Titania and titania-silver nanoparticle deposits made by Liquid Flame Spray and their functionality as photocatalyst for organic- and biofilm removal

Keskinen, H., Mäkelä, J. M., Aromaa, M., Keskinen, J., Areva, S., Teixeira, C. V., Rosenholm, J. B., Pore, V., Ritala, M., Leskelä, M., Raulio, M., Salkinoja-Salonen, M., Levänen, E. & Mäntylä, T., 2006, In : Catalysis Letters. 111, 3-4, p. 127-132 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Transparent superhydrophobic surfaces by self-assembly of hydrophobic monolayers on nanostructured surfaces

Kemell, M., Färm, E., Leskelä, M. & Ritala, M., 2006, In : Physica Status Solidi. A, Applied Research. 203, 6, p. 1453-1458 6 p.

Research output: Contribution to journalArticleScientificpeer-review

2005

A comparative study of atomic layer deposited advanced high-k dielectrics

Dueñas, S., Castán, H., García, H., Barbolla, J., Kukli, K., Aarik, J., Ritala, M. & Leskelä, M., 2005, 2005 Spanish Conference on Electron Devices. Institute of Electrical and Electronics Engineers, p. 29-32 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Aging of electroluminescent ZnS: Mn thin films deposited by atomic layer deposition processes

Ihanus, J., Lankinen, M. P., Kemell, M., Ritala, M. & Leskelä, M., 1 Dec 2005, In : Journal of Applied Physics. 98, 11, p. 113526 8 p., 113526.

Research output: Contribution to journalArticleScientificpeer-review

ALD of rhodium thin films from Rh(acac)(3) and oxygen

Aaltonen, T., Ritala, M. & Leskelä, M., 2005, In : Electrochemical and Solid-State Letters. 8, 8, p. C99-C101 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition and characterization of HfO2 films on noble metal film substrates

Kukli, K., Aaltonen, T., Aarik, J., Lu, J., Ritala, M., Ferrari, S., Hårsta, A. & Leskelä, M., 2005, In : Journal of the Electrochemical Society. 152, 7, p. F75-F82 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition in nanometer-level replication of cellulosic substances and preparation of photocatalytic TiO/cellulose composites

Kemell, M., Pore, V., Ritala, M., Leskelä, M. & Linden, M., 2005, In : Journal of the American Chemical Society. 127, 41, p. 14178-14179 2 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

Kukli, K., Pilvi, T., Ritala, M., Sajavaara, T., Lu, J. & Leskelä, M., 2005, In : Thin Solid Films. 491, p. 328-338 11 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Metal Thin Films

Leskelä, M., Aaltonen, T., Hämäläinen, J., Niskanen, A. J. & Ritala, M. K., 2005, In : Proceedings - Electrochemical Society. 9, p. 545-554

Research output: Contribution to journalConference articleScientificpeer-review

Atomic Layer Deposition of Molybdenum Nitride Films

Alen, P., Ritala, M. & Leskelä, M., 2005, Advanced Metallization Conference 2004 (AMC 2004). Erb, D. (ed.). Materials Research Society, p. 763-768 6 p. (MRS Conference Proceedings Series; vol. 20).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition of molybdenum nitride thin films for Cu metallizations

Alén, P., Ritala, M., Arstila, K., Keinonen, J. & Leskelä, M., 2005, In : Journal of the Electrochemical Society. 152, 2, p. G361-G366

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Noble Metals

Aaltonen, T., Ritala, M. & Leskelä, M., 2005, Proceedings of Advanced Metallization Conference 2004. Erb, D., Ramm, P., Masu, K. & Osaki, A. (eds.). Warrensdale, PA: Materials Research Society, p. 663-667 5 p. (MRS Conference Proceedings Series; vol. 20).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kukli, K., Ritala, M., Pilvi, T., Aaltonen, T., Aarik, J., Lautala, M. & Leskelä, M., 2005, In : Materials Science and Engineering B: Advanced Functional Solid-state Materials. 118, 1-3, p. 112-116 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Characterization of aluminum and titanium oxides deposited on 4H SiC by atomic layer deposition technique

Wolborski, M., Bakowski, M., Pore, V., Ritala, M., Leskelä, M., Schöner, A. & Hallen, A., 2005, In : Materials Science Forum. 483-485, p. 701-704 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Comparative study on electrical properties of atomic layer deposited high-permittivity materials on silicon substrates

Dueñas, S., Castán, H., Garcia, H., Barbolla, J., Kukli, K., Ritala, M. & Leskelä, M., 2005, In : Thin Solid Films. 474, 1-2, p. 222-229 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water

Niinistö, J., Putkonen, M., Niinistö, L., Stoll, S. L., Kukli, K., Sajavaara, T., Ritala, M. & Leskelä, M., 2005, In : Journal of Materials Chemistry. 15, 23, p. 2271-2275 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Diffractive optics in industry and research: novel components for optical security systems

Laakkonen, P., Turunen, J., Pietarinen, J., Siitonen, S., Laukkanen, J., Jefimovs, K., Orava, J., Ritala, M., Pilvi, T., Tuovinen, H., Ventola, K., Vallius, T., Kaipiainen, M. & Kuittinen, M., 2005, Optical Security Systems (Proceedings Volume) / Editor(s): Zbigniew Jaroszewicz; Sergei Y. Popov; Frank Wyrowski. - SPIE-The International Society for Optical Engineering, 2005. Jaroszewicz, Z., Popov, S. Y. & Wyrowski, F. (eds.). SPIE, Vol. 5954. p. art no 595402 7 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Electrical characterization of atomic-layer-deposited hafnium silicate for alternative gate dielectric application

Dueñas, S., Castán, H., García, H., Barbolla, J., Kukli, K., Ritala, M. & Leskelä, M., 2005, 2005 Spanish Conference on Electron Devices: Proceedings. Institute of Electrical and Electronics Engineers, p. 45-48 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

Dueñas, S., Castán, H., Garcia, H., Barbolla, J., Kukli, K., Aarik, J., Ritala, M. & Leskelä, M., 2005, In : Microelectronics Reliability. 45, 5-6, p. 949-952 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature

Kukli, K., Aarik, J., Uustare, T., Lu, J., Ritala, M., Aidla, A., Pung, L., Hårsta, A., Leskelä, M., Kikas, A. & Sammelselg, V., 2005, In : Thin Solid Films. 479, 1-2, p. 1-11 11 p.

Research output: Contribution to journalArticleScientificpeer-review

In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)(2) and water

Niinistö, J., Rahtu, A., Putkonen, M., Ritala, M., Leskelä, M. & Niinistö, L., 2005, In : Langmuir. 21, 16, p. 7321-7325 5 p.

Research output: Contribution to journalArticleScientificpeer-review

In situ reaction mechanism studies on the atomic layer deposition of Al2O3 from (CH3)(2)AlCl and water

Matero, R., Rahtu, A. & Ritala, M., 2005, In : Langmuir. 21, p. 3498-3502 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Low-temperature deposition of aluminum oxide by radical enhanced atomic layer deposition

Niskanen, A., Arstila, K., Ritala, M. & Leskela, M., 2005, In : Journal of the Electrochemical Society. 152, 7, p. F90-F93 4 p.

Research output: Contribution to journalArticleScientificpeer-review

New approach to the ALD of Bismuth silicates: Bi(CHSiMe) acting as a precursor for both Bismuth and silicon

Harjuoja, J., Hatanpää, T., Vehkamäki, M., Väyrynen, S., Putkonen, M., Niinistö, L., Ritala, M., Leskelä, M. & Rauhala, E., 2005, In : Chemical Vapor Deposition. 11, 8-9, p. 362-367 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Process for Producing Bismuth-Containing Oxide Films

Leskelä, M., Vehkamäki, M., Hatanpää, T. T. & Ritala, M., 28 Apr 2005, IPC No. C23C16/00 C23C16/40 C23C16/06 , Patent No. 7618681 , 17 Nov 2009

Research output: PatentScientific