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Publications 1991 2019

2005

Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films

Niskanen, A., Rahtu, A., Ritala, M., Leskelä, M., Sajavaara, T. & Arstila, K., 2005, In : Journal of the Electrochemical Society. 152, 1, p. G25-G28

Research output: Contribution to journalArticleScientificpeer-review

Recent developments in the MOCVD and ALD of rare earth oxides and silicates

Jones, A. C., Aspinall, H. C., Chalker, R. R., Potter, R. J., Kukli, K., Rahtu, A., Ritala, M. & Leskela, M., 2005, In : Materials Science and Engineering B: Advanced Functional Solid-state Materials. 118, 1-3, p. 97-104 8 p.

Research output: Contribution to journalArticleScientificpeer-review

The growth and diffusion barrier properties of atomic layer deposition NbNx thin films

Alén, P., Ritala, M., Arstila, K., Keinonen, J. & Leskelä, M., 2005, In : Thin Solid Films. 491, 1-2, p. 235-241 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Thin film deposition methods for CulnSe(2) solar cells

Kemell, M., Ritala, M. & Leskelä, M., 2005, In : Critical Reviews in Solid State & Materials Sciences. 30, 1, p. 1-31 31 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2004

ALD 2004 Abstract book

Ritala, M. & Ihanus, J., 2004, Yliopistopaino. 172 p.

Research output: Book/ReportAnthology or special issueScientificpeer-review

ALD of Ta(Si)N thin films using TDMAS as a reducing agent and as a Si precursor

Alén, P., Aaltonen, T., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Hooker, J. C. & Maes, J. W., 2004, In : Journal of the Electrochemical Society. 151, 8, p. G523-G527 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition

Ritala, M., 2004, High-k Gate Dielectrics. Houssa, M. (ed.). Institute of Physics Publishing, p. 17-64

Research output: Chapter in Book/Report/Conference proceedingChapterProfessional

Atomic Layer Deposition - an Alternative to the Deposition of Optical Coatings?

Ritala, M. & Leskelä, M., 2004, Technical Digest of 9th Optical Interference Coatings Meeting . Tucson , p. art no MB1 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition of hafnium dioxide films from hafnium hydroxylamide and water

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Jones, A. C. & Tobin, N. L., 2004, In : Chemical Vapor Deposition. 10, 2, p. 91-96 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of iridium thin films

Aaltonen, T., Ritala, M., Sammelselg, V. & Leskelä, M., 2004, In : Journal of the Electrochemical Society. 151, 8, p. G489-G492 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of molybdenum nitride diffusion barriers for Cu interconnects

Alen, P., Ritala, M., Arstila, K., Keinonen, J., Sajavaara, T. & Leskela, M., 2004, Unknown host publication. Erb, D., Ramm, P., Masu, K. & Osaki, A. (eds.). p. 763-768 6 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature

Aaltonen, T., Ritala, M., Tung, Y-L., Chi, Y., Arstila, K., Meinander, K. & Leskelä, M., 2004, In : Journal of Materials Research. 19, 11, p. 3353-3358 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of photocatalytic TiO2 thin films from titanium tetramethoxide and water

Pore, V., Rahtu, A., Leskelä, M., Ritala, M., Sajavaara, T. & Keinonen, J., 2004, In : Chemical Vapor Deposition. 10, 3, p. 143-148 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of ruthenium thin films from Ru(thd)(3) and oxygen

Aaltonen, T., Ritala, M., Arstila, K., Keinonen, J. & Leskelä, M., 2004, In : Chemical Vapor Deposition. 10, 4, p. 215-219 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of strontium tantalate thin films from bimetallic precursors and water

Vehkamäki, M., Ritala, M., Leskelä, M., Jones, A. C., Davies, H. O., Sajavaara, T. & Rauhala, E., 2004, In : Journal of the Electrochemical Society. 151, 4, p. F69-F72 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Bismuth precursors for atomic layer deposition of bismuth-containing oxide films

Vehkamäki, M., Hatanpää, T., Ritala, M. & Leskelä, M., 2004, In : Journal of Materials Chemistry. 14, p. 3191-3197 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Crystallization in hafnia- and zirconia-based systems

Ushakov, S. V., Navrotsky, A., Yang, Y., Stemmer, S., Kukli, K., Ritala, M., Leskelä, M., Fejes, P., Demkov, A., Wang, C., Nguyen, B-Y., Triyoso, D. & Tobin, P., 2004, In : Physica Status Solidi. B: Basic Research. 241, 10, p. 2268-2278 11 p.

Research output: Contribution to journalArticleScientificpeer-review

Dielectric permittivity and intercalation parameters of Li ion intercalated atomic layer deposited ZrO2

Jonsson, A. K., Niklasson, G. A., Ritala, M., Leskelä, M. & Kukli, K., 2004, In : Journal of the Electrochemical Society. 151, 3, p. F54-F58 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Kukli, K., Aarik, J., Ritala, M., Uustare, T., Sajavaara, T., Lu, J., Sundqvist, J., Aidla, A., Pung, L., Hårsta, A. & Leskelä, M., 2004, In : Journal of Applied Physics. 96, 9, p. 5298-5307 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Electroluminescent SrS and BaS thin films deposited by ALD using cyclopentadienyl precursors

Ihanus, J., Hänninen, T., Hatanpää, T., Ritala, M. & Leskelä, M., 2004, In : Journal of the Electrochemical Society. 151, 10, p. H221-H225 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Evaluation of a praseodymium precursor for atomic layer deposition of oxide dielectric films

Kukli, K., Ritala, M., Pilvi, T., Sajavaara, T., Leskelä, M., Jones, A. C., Aspinall, H. C., Gilmer, D. C. & Tobin, P. J., 2004, In : Chemistry of Materials. 16, 24, p. 5162-5168 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Evaluation of new aminoalkoxide precursors for atomic layer deposition. Growth of zirconium dioxide thin films and reaction mechanism studies

Matero, R., Ritala, M., Leskelä, M., Sajavaara, T., Jones, A. C. & Roberts, J. L., 2004, In : Chemistry of Materials. 16, 26, p. 5630-5636 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Growth of Cu thin films by the successive ionic layer adsorption and reaction (SILAR) method

Lindroos, S., Ruuskanen, T., Ritala, M. & Leskelä, M., 2004, In : Thin Solid Films. 460, 1-2, p. 36-40 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Hafnium silicon oxide films prepared by atomic layer deposition

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Gilmer, D. C. & Tobin, P. J., 2004, In : Materials Science and Engineering B: Advanced Functional Solid-state Materials. 109, 1-3, p. 2-5 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Liquid Injection MOCVD and ALD Studies of "Single Source" Sr-Nb and Sr-Ta Precursors

Potter, R. J., Marshall, P. A., Roberts, J. L., Jones, A. C., Chalker, P. R., Vehkamäki, M., Ritala, M., Leskelä, M., Williams, P. A., Davies, H. O., Tobin, N. L. & Smith, L. M., 2004, Materials Research Society Symposium Proceedings . Vol. 784. p. 97 12 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

On the Interface Quality of MIS Structures Fabricated from Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5-Ta2O5-Nb2O5 Dielectric Thin Films

Dueñas, S., Castán, H., Garcia, H., Barbolla, J., Kukli, K., Ritala, M. & Leskelä, M., 2004, Materials Research Society Symposium Proceedings . p. 147 6 p. (Materials Research Society Online Proceedings Library; vol. 786).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Properties of HfO2 thin films grown by ALD from hafnium tetrakis(ethylmethylamide) and water

Kukli, K., Ritala, M., Lu, J., Hårsta, A. & Leskelä, M., 2004, In : Journal of the Electrochemical Society. 151, 8, p. F189-F193 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Properties of oxide film atomic layer deposited from tetraethoxy silane, hafnium halides, and water

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Hegde, R. I., Gilmer, D. C. & Tobin, P. J., 2004, In : Journal of the Electrochemical Society. 151, 5, p. F98-F104 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Some recent developments in the MOCVD and ALD of high-kappa dielectric oxides

Jones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Kukli, K., Rahtu, A., Ritala, M. & Leskelä, M., 2004, In : Journal of Materials Chemistry. 14, p. 3101-3112 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor

Niinistö, J., Putkonen, M., Niinistö, L., Kukli, K., Ritala, M. & Leskelä, M., 2004, In : Journal of Applied Physics. 95, 1, p. 84-91 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Synthesis and characterisation of cyclopentadienyl complexes of barium: precursors for atomic layer deposition of BaTiO3

Hatanpää, T., Vehkamäki, M., Mutikainen, I., Kansikas, J., Ritala, M. & Leskelä, M., 2004, In : Dalton Transactions. 8, p. 1181-1188 8 p.

Research output: Contribution to journalArticleScientificpeer-review

XPS and electroluminescence studies on SrS1-xSex and ZnS1-xSex thin films deposited by atomic layer deposition technique

Ihanus, J., Lambers, E., Holloway, P. H., Ritala, M. & Leskelä, M., 2004, In : Journal of Crystal Growth. 260, 3-4, p. 440-446 7 p.

Research output: Contribution to journalArticleScientificpeer-review

2003

Alkaline earth cyclopentadienyl compounds as precursors for atomic layer deposition

Hatanpää, T., Hänninen, T., Ihanus, J., Kansikas, J., Mutikainen, I., Vehkamäki, M., Ritala, M. & Leskelä, M., 2003, Chemical vapor deposition XVI and EUROCVD 14: proceedings of the international symposium. Allendorf, M. D., Maury, F. & Teyssandier, F. (eds.). Pennington, NJ : The Electrochemical Society , Vol. 2003-08. p. 516-522 7 p. (Electrochemical Society Proceedings ).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition chemistry: Recent developments and future challenges

Leskelä, M. & Ritala, M., 2003, In : Angewandte Chemie (International Edition). 42, 45, p. 5548-5554 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition growth of zirconium doped In2O3 films

Asikainen, T., Ritala, M. & Leskelä, M., 2003, In : Thin Solid Films. 440, 1-2, p. 152-154 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of hafnium dioxide films from 1-methoxy-2-methyl-2-propanolate complex of hafnium

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Jones, A. C. & Roberts, J. L., 2003, In : Chemistry of Materials. 15, 8, p. 1722-1727 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of hafnium dioxide films using hafnium bis(2-butanolate)bis(1-methoxy-2-methyl-2-propanolate) and water

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Jones, A. C. & Roberts, J. L., 2003, In : Chemical Vapor Deposition. 9, 6, p. 315-320 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of HfO2 thin films and nanolayered HfO2-Al2O3-Nb2O5 dielectrics

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Gilmer, D. C., Hegde, R., Rai, R. & Prabhu, L., 2003, In : Journal of Materials Science: Materials in Electronics. 14, 5-7, p. 361-367 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of platinum thin films

Aaltonen, T., Ritala, M., Sajavaara, T., Keinonen, J. & Leskelä, M., 2003, In : Chemistry of Materials. 15, 9, p. 1924-1928 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of ruthenium from RuCp₂ and oxygen: film growth and reaction mechanism studies

Aaltonen, T., Rahtu, A., Ritala, M. & Leskelä, M., 2003, Electrochemical Society Proceedings . Vol. 2003-08. p. 946-953 (Electrcochemical Society Proceedings).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition of thin films for microelectronics

Ritala, M. & Leskelä, M., 2003, In : Proceedings - Electrochemical Society. 8, p. 479-490

Research output: Contribution to journalConference articleScientificpeer-review

Blue- and green-emitting SrS:Cu electroluminescent devices deposited by the atomic layer deposition technique

Ihanus, J., Ritala, M., Leskelä, M., Soininen, E., Park, W., Kaloyeros, A. E., Harris, W., Barth, K. W., Topol, A. W., Sajavaara, T. & Keinonen, J., 2003, In : Journal of Applied Physics. 94, 6, p. 3862-3868 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Conductance transient, capacitance-voltage and deep-level transient spectroscopy characterization of atomic layer deposited hafnium and zirconium oxide thin films

Dueñas, S., Castán, H., Barbolla, J., Kukli, K., Ritala, M. & Leskelä, M., 2003, In : Solid-State Electronics. 47, 10, p. 1623-1629 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Electrochemical preparation of In and Al doped ZnO thin films for CuInSe2 solar cells

Kemell, M., Dartigues, F., Ritala, M. & Leskelä, M., 2003, In : Thin Solid Films. 434, 1-2, p. 20-23 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Method of Depositing Rare Earth Oxide Thin Films

Niinistö, J., Putkonen, M., Ritala, M., Räisänen, P., Niskanen, A. & Leskelä, M., 13 Apr 2003, IPC No. H01L021/44; H01L021/31; H01L021/469, Patent No. 6858546, 22 Feb 2005

Research output: PatentScientific

Rare-earth oxide thin films as gate oxides in MOSFET transistors

Leskelä, M. & Ritala, M., 2003, In : Journal of Solid State Chemistry. 171, p. 170-174 5 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Reaction mechanism studies on atomic layer deposition of ruthenium and platinum

Aaltonen, T., Rahtu, A., Ritala, M. & Leskelä, M., 2003, In : Electrochemical and Solid-State Letters. 6, 9, p. C130-C133 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Ruthenium thin films grown by atomic layer deposition

Aaltonen, T., Alén, P., Ritala, M. & Leskelä, M., 2003, In : Chemical Vapor Deposition. 9, 1, p. 45-49 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2002

Atomic Layer Deposition

Ritala, M. & Leskelä, M., 2002, Handbook of Thin Films Materials: Deposition and Processing of Thin Films. Nalwa, H. S. (ed.). Academic Press, Vol. Volume 1. p. 103-159

Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

Atomic layer deposition (ALD): from precursors to thin film structures

Leskelä, M. & Ritala, M., 2002, In : Thin Solid Films. 409, 1, p. 138-146 9 p.

Research output: Contribution to journalReview ArticleScientificpeer-review