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Publications 1991 2019

2002

Atomic layer deposition of Al2O3, ZrO2, Ta2O5, and Nb2O5 based nanolayered dielectrics

Kukli, K., Ritala, M., Leskelä, M., Sajavaara, T., Keinonen, J., Gilmer, D., Bagchi, S. & Prabhu, L., 2002, In : Journal of Non-Crystalline Solids. 303, p. 35-39 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of Al2O3 films using AlCl3 and Al((OPr)(3) as precursors

Räisänen, P. I., Ritala, M. & Leskelä, M., 2002, In : Journal of Materials Chemistry. 12, p. 1415-1418 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of hafnium dioxide films from hafnium tetrakis(ethylmethylamide) and water

Kukli, K., Ritala, M., Sajavaara, T., Keinonen, J. & Leskelä, M., 2002, In : Chemical Vapor Deposition. 8, 5, p. 199-204 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of hafnium dioxide films from hafnium tetrakis(ethylmethylamide) and water

Kukli, K., Ritala, M., Sajavaara, T., Keinonen, J. & Leskelä, M., 2002, In : Advanced Materials. 14, p. A199-+ 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of SrS and BaS thin films using cyclopentadienyl precursors

Ihanus, J., Hänninen, T., Hatanpää, T., Aaltonen, T., Mutikainen, I., Sajavaara, T., Keinonen, J., Ritala, M. & Leskelä, M., 2002, In : Chemistry of Materials. 14, 5, p. 1937-1944 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of TiO2 thin films from TiI4 and H2O

Aarik, J., Aidla, A., Uustare, T., Kukli, K., Sammelselg, V., Ritala, M. & Leskelä, M., 2002, In : Applied Surface Science. 193, p. 277-286 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of titanium nitride thin films using tert-butylamine and allylamine as reductive nitrogen sources

Juppo, M., Alén, P., Ritala, M., Sajavaara, T., Keinonen, J. & Leskelä, M., 2002, In : Electrochemical and Solid-State Letters. 5, p. C4-C6 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor

Matero, R., Ritala, M., Leskelä, M., Jones, A. C., Williams, P. A., Bickley, J. F., Steiner, A., Leedham, T. J. & Davies, H. O., 2002, In : Journal of Non-Crystalline Solids. 303, p. 24-28 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors

Jones, A. C., Williams, P. A., Roberts, J. L., Leedham, T. J., Davies, H. O., Matero, R., Ritala, M. & Leskelä, M., 2002, Materials Research Society symposia proceedings . New York, NY : North-Holland, p. 145-150 (Materials Research Society Proceedings; vol. 716).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic Layer Deposition Processes of HfO2 Thin Films and Layered HfO2-Al2O3-Nb2O5 Dielectrics

Kukli, K., Ritala, M. & Leskelä, M., 2002, Conference Papers : 4th International Conference on Materials for Microelectronics and Nanoengineering . p. 97-100

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

Kukli, K., Ritala, M., Sajavaara, T., Keinonen, J. & Leskelä, M., 2002, In : Thin Solid Films. 416, p. 72-79 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Compensation of temperature effects in quartz crystal microbalance measurements

Rahtu, A. & Ritala, M., 2002, In : Applied Physics Letters. 80, 3, p. 521-523 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Influence of growth temperature on properties of zirconium dioxide films grown by atomic layer deposition

Kukli, K., Ritala, M., Aarik, J., Uustare, T. & Leskelä, M., 2002, In : Journal of Applied Physics. 92, 4, p. 1833-1840 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon

Kukli, K., Ritala, M., Uustare, T., Aarik, J., Forsgren, K., Sajavaara, T., Leskelä, M. & Hårsta, A., 2002, In : Thin Solid Films. 410, 1-2, p. 53-60 8 p.

Research output: Contribution to journalArticleScientificpeer-review

In situ mass spectrometry study on surface reactions in atomic layer deposition of TiN and Ti(Al)N thin films

Juppo, M., Rahtu, A. & Ritala, M., 2002, In : Chemistry of Materials. 14, p. 281-287 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Menetelmä metallinitridiohutkalvojen valmistamiseksi

Leskelä, M., Ritala, M., Alén, P. & Juppo, M., 2002, IPC No. B05D 1/12 ; C23C 16/44 , Patent No. 109770 , 15 Oct 2002

Research output: PatentScientific

Method to Make Nitride Thin Films

Leskelä, M., Ritala, M., Alen, P. J. & Juppo, M., 2002, IPC No. C30B/2814, Patent No. 6706115, 16 Mar 2004

Research output: PatentScientific

New approaches to the atomic layer deposition of tantalum nitride and titanium nitride thin films

Juppo, M., Alén, P., Ritala, M. & Leskelä, M., 2002, Conference Proceedings ULSI XVII . p. 633-639

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Process for producing metal thin films by ALD

Aaltonen, T., Alén, P., Ritala, M. & Leskelä, M., 2002, IPC No. B05D/512, Patent No. 6824816 , 30 Nov 2004

Research output: PatentScientific

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

Kukli, K., Ritala, M., Sundqvist, J., Aarik, J., Lu, J., Sajavaara, T., Leskelä, M. & Hårsta, A., 2002, In : Journal of Applied Physics. 92, 10, p. 5698-5703 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Reaction mechanism studies on the atomic layer deposition of ZrxTiyOz using the novel metal halide-metal alkoxide approach

Rahtu, A. & Ritala, M., 2002, In : Langmuir. 18, 25, p. 10046-10048 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Reaction mechanism studies on the zirconium chloride-water atomic layer deposition process

Rahtu, A. & Ritala, M., 2002, In : Journal of Materials Chemistry. 12, 5, p. 1484-1489 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Reaction mechanism studies on titanium isopropoxide-water atomic layer deposition process

Rahtu, A. & Ritala, M., 2002, In : Chemical Vapor Deposition. 8, 1, p. 21-28 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Tert-butylamine and allylamine as reductive nitrogen sources in atomic layer deposition of TaN thin films

Alén, P., Juppo, M., Ritala, M., Leskelä, M., Sajavaara, T. & Keinonen, J., 2002, In : Journal of Materials Research. 17, p. 107-114 8 p.

Research output: Contribution to journalArticleScientificpeer-review

2001

(Ta1-xNbx)(2)O-5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I-V characteristics

Strømme, M., Niklasson, G. A., Ritala, M., Leskelä, M. & Kukli, K., 2001, In : Journal of Applied Physics. 90, 9, p. 4532-4542 11 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of SrTiO3 thin films from a novel strontium precursor-strontium-bis(tri-isopropylcyclopentadienyl)

Vehkamäki, M., Hänninen, T., Ritala, M., Leskelä, M., Sajavaara, T., Rauhala, E. & Keinonen, J., 2001, In : Chemical Vapor Deposition. 7, 2, p. 75-80 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of Ta(Al)N(C) thin films using trimethylaluminum as a reducing agent

Alén, P., Juppo, M., Ritala, M., Sajavaara, T., Keinonen, J. & Leskelä, M., 2001, In : Journal of the Electrochemical Society. 148, 10, p. G566-G571 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

Kukli, K., Forsgren, K., Aarik, J., Uustare, T., Aidla, A., Niskanen, A., Ritala, M., Leskelä, M. & Hårsta, A., 2001, In : Journal of Crystal Growth. 231, p. 262-272 11 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of zirconium titanium oxide from titanium isopropoxide and zirconium chloride

Rahtu, A., Ritala, M. & Leskelä, M., 2001, In : Chemistry of Materials. 13, p. 1528-1532 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Development of dielectric properties of niobium oxide, tantalum oxide, and aluminum oxide based nanolayered materials

Kukli, K., Ritala, M. & Leskelä, M., 2001, In : Journal of the Electrochemical Society. 148, 2, p. F35-F41 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor

Kukli, K., Forsgren, K., Ritala, M., Leskelä, M., Aarik, J. & Hårsta, A., 2001, In : Journal of the Electrochemical Society. 148, 12, p. F227-F232 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Electrochemical quartz crystal microbalance study of the electrodeposition mechanisms of CuInSe2 thin films

Kemell, M., Saloniemi, H., Ritala, M. & Leskelä, M., 2001, In : Journal of the Electrochemical Society. 148, 2, p. C110-C118 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Electrochemical quartz crystal microbalance study on cyclic electrodeposition of PbS thin-films

Saloniemi, H., Kemell, M., Ritala, M. & Leskelä, M., 2001, In : Thin Solid Films. 386, p. 32-40 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Epäorgaanisen materiaalikemian opetus juhli 10-vuotistaivaltaan Helsingin yliopistossa

Ritala, M., 2001, In : Kemia - Kemi. 28, 2, p. 110-112

Research output: Contribution to journalArticleProfessional

In situ characterization of atomic layer deposition of SrTiO3

Rahtu, A., Hänninen, T. P. & Ritala, M., 2001, In : Journal de physique. IV. 11, PR3, p. 923-930 8 p.

Research output: Contribution to journalArticleScientificpeer-review

In situ mass spectrometry study on atomic layer deposition from metal (Ti, Ta, and Nb) ethoxides and water

Rahtu, A., Kukli, K. & Ritala, M., 2001, In : Chemistry of Materials. 13, p. 817-823 7 p.

Research output: Contribution to journalArticleScientificpeer-review

In situ quadrupole mass spectrometry and quartz crystal microbalance studies on the atomic layer deposition of titanium dioxide from titanium tetrachloride and water

Matero, R., Rahtu, A. & Ritala, M., 2001, In : Chemistry of Materials. 13, p. 4506-4511 6 p.

Research output: Contribution to journalArticleScientificpeer-review

In situ quartz crystal microbalance and quadrupole mass spectrometry studies of atomic layer deposition of aluminum oxide from trimethylaluminum and water

Rahtu, A., Alaranta, T. & Ritala, M., 2001, In : Langmuir. 17, p. 6506-6509 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Trimethylaluminum as a reducing agent in the atomic layer deposition of Ti(Al)N thin films

Juppo, M., Alén, P., Ritala, M. & Leskelä, M., 2001, In : Chemical Vapor Deposition. 7, p. 211-217 7 p.

Research output: Contribution to journalArticleScientificpeer-review

2000

Aging of electroluminescent devices based on ZnS deposited with atomic layer epitaxy from various precursors

Soenen, B., Ihanus, J., Stuyven, G., De Visschere, P., Ritala, M. & Leskelä, M., 2000, In : Journal of the Society for Information Display. 2000, Supplement-1, p. 33-38 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer CVD in the Bi-Ti-O system

Schuisky, M., Kukli, K., Ritala, M., Hårsta, A. & Leskela, M., 2000, In : Chemical Vapor Deposition. 6, 3, p. 139-145 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of high-k oxides

Ritala, M., Kukli, K., Vehkamäki, M., Hänninen, T., Hatanpää, T. T., Leskelä, M. & Räisänen, P. I., 2000, Proceedings - Electrochemical Society: CVD XV. The Electrochemical Society , Vol. 2000-13. p. 597-604 8 p. (Electrochemical Society Proceedings).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source

Räisänen, P., Kukli, K., Rahtu, A., Ritala, M. & Leskelä, M., 2000, Chemical vapor deposition XV . The Electrochemical Society , p. 623-628 (Electrochemical Society Proceedings).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources

Ritala, M., Kukli, K., Rahtu, A., Räisänen, P. I., Leskelä, M., Sajavaara, T. & Keinonen, J., 2000, In : Science. 288, p. 319-321 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of titanium oxide from TiI4 and H2O2

Kukli, K., Ritala, M., Schuisky, M., Leskelä, M., Sajavaara, T., Keinonen, J., Uustare, T. & Hårsta, A., 2000, In : Chemical Vapor Deposition. 6, 6, p. 303-310 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water

Aarik, J., Aidla, A., Sammelselg, V., Uustare, T., Ritala, M. & Leskelä, M., 2000, In : Thin Solid Films. 370, p. 163-172 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Effect of water dose on the atomic layer deposition rate of oxide thin films

Matero, R., Rahtu, A., Ritala, M., Leskelä, M. & Sajavaara, T., 2000, In : Thin Solid Films. 368, p. 1-7 7 p.

Research output: Contribution to journalArticleScientificpeer-review