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Publications 1991 2019

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Review Article
2018

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Mäntymäki, M., Ritala, M. & Leskelä, M., 8 Aug 2018, In : Coatings. 8, 8, 40 p., 277.

Research output: Contribution to journalReview ArticleScientificpeer-review

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2014

Atomic Layer Deposition of Noble Metals and Their Oxides

Hämäläinen, J., Ritala, M. & Leskelä, M., 2014, In : Chemistry of Materials. 26, 1, p. 786-801 16 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2012

Double metal alkoxides of lithium: Synthesis, structure and applications in materials chemistry

Mäntymäki, M., Ritala, M. & Leskelä, M., 2012, In : Coordination Chemistry Reviews. 256, 9-10, p. 854-877 24 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2009

Atomic layer deposition of high-k oxides of the group 4 metals for memory applications

Niinistö, J., Kukli, K., Heikkilä, M., Ritala, M. & Leskelä, M., 2009, In : Advanced Engineering Materials. 11, 4, p. 223-234 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2007

Exploitation of atomic layer deposition for nanostructured materials

Leskelä, M., Kemell, M., Kukli, K., Pore, V., Santala, E., Lu, J. & Ritala, M., 2007, In : Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems. 27, p. 1504-1508 5 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2006

Rare-earth oxide thin films for gate dielectrics in microelectronics

Leskelä, M., Kukli, K. & Ritala, M., 2006, In : Journal of Alloys and Compounds. 418, 1-2, p. 27-34 8 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2005

Thin film deposition methods for CulnSe(2) solar cells

Kemell, M., Ritala, M. & Leskelä, M., 2005, In : Critical Reviews in Solid State & Materials Sciences. 30, 1, p. 1-31 31 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2004

Some recent developments in the MOCVD and ALD of high-kappa dielectric oxides

Jones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Kukli, K., Rahtu, A., Ritala, M. & Leskelä, M., 2004, In : Journal of Materials Chemistry. 14, p. 3101-3112 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2003

Rare-earth oxide thin films as gate oxides in MOSFET transistors

Leskelä, M. & Ritala, M., 2003, In : Journal of Solid State Chemistry. 171, p. 170-174 5 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

2002

Atomic layer deposition (ALD): from precursors to thin film structures

Leskelä, M. & Ritala, M., 2002, In : Thin Solid Films. 409, 1, p. 138-146 9 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1999

ALD precursor chemistry: Evolution and future challenges

Leskelä, M. & Ritala, M., 1999, In : Journal de physique. IV. 9, p. 837-852 16 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Atomic layer epitaxy - a valuable tool for nanotechnology?

Ritala, M. & Leskelä, M., 1999, In : Nanotechnology. 10, p. 19-24 6 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1997

Advanced ALE processes of amorphous and polycrystalline films

Ritala, M., 1997, In : Applied Surface Science. 112, p. 223-230 8 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1996

Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications

Niinistö, L., Ritala, M. & Leskelä, M., 1996, In : Materials Science and Engineering B: Advanced Functional Solid-state Materials. 41, p. 23-29 7 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1995

ATOMIC LAYER EPITAXY IN DEPOSITION OF VARIOUS OXIDE AND NITRIDE THIN-FILMS

Leskelä, M. & Ritala, M., 1995, In : Journal de physique. IV. 5, p. 937-951 15 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

1994

Atomic Layer Epitaxy Growth of Titanium, Zirconium and Hafnium Dioxide Thin Films

Ritala, M., 1994, In : Annales Academiae Scientiarum Fennicae. Chemica. 257, p. 1-48

Research output: Contribution to journalReview ArticleScientificpeer-review