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  • PL 55 (A. I. Virtasen aukio 1)

    00014

    Finland

19992019
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Publications 1999 2019

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Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Films

Väyrynen, K., Hatanpää, T., Mattinen, M., Mizohata, K., Meinander, K., Räisänen, J., Link, J., Stern, R., Ritala, M. & Leskela, M., Feb 2019, In : Advanced Materials Interfaces . 6, 3, 7 p., 1801291.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of PbI₂ Thin Films

Popov, G., Mattinen, M. J., Hatanpää, T., Vehkamäki, M., Kemell, M., Mizohata, K., Räisänen, J., Ritala, M. & Leskelä, M., 12 Feb 2019, In : Chemistry of Materials. 31, 3, p. 1101–1109 9 p.

Research output: Contribution to journalArticleScientificpeer-review

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Polyelectrolyte stabilized nanodiamond dispersions

Tiainen, T., Myllymäki, T. T. T., Hatanpää, T., Tenhu, H. & Hietala, S., May 2019, In : Diamond and Related Materials. 95, p. 185-194 10 p.

Research output: Contribution to journalArticleScientificpeer-review

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Intralanthanide Separation on Layered Titanium(IV) Organophosphate Materials via a Selective Transmetalation Process

Zhang, W., Hietala, S., Khryashchev, L., Hatanpää, T., Doshi, B. & Koivula, R., 4 Jul 2018, In : ACS Applied Materials & Interfaces. 10, 26, p. 22083-22093 11 p.

Research output: Contribution to journalArticleScientificpeer-review

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2017

Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth

Mattinen, M., Hatanpaa, T., Sarnet, T., Mizohata, K., Meinander, K., King, P. J., Khriachtchev, L., Räisänen, J., Ritala, M. & Leskelä, M., 22 Sep 2017, In : Advanced Materials Interfaces . 4, 18, 11 p., 1700123.

Research output: Contribution to journalArticleScientificpeer-review

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Studies on Thermal Atomic Layer Deposition of Silver Thin Films

Mäkelä, M., Hatanpää, T., Mizohata, K., Meinander, K., Niinistö, J., Räisänen, J., Ritala, M. & Leskelä, M., 14 Mar 2017, In : Chemistry of Materials. 29, 5, p. 2040-2045 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films

Mäkelä, M. I., Hatanpää, T. T., Mizohata, K., Räisänen, J. A., Ritala, M. K. & Leskelä, M. A., 27 Jun 2017, In : Chemistry of Materials. 29, 14, p. 6130–6136 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Titanium Alkylphosphate Functionalised Mesoporous Silica for Enhanced Uptake of Rare-Earth Ions

Zhang, W., Avdibegovic, D., Koivula, R., Hatanpää, T., Hietala, S., Regadio, M., Binnemans, K. & Harjula, R., 7 Dec 2017, In : Journal of Materials Chemistry. A. 5, 45, p. 23805-23814 10 p.

Research output: Contribution to journalArticleScientificpeer-review

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2016

Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)(3)As through the GaAs process

Sarnet, T., Hatanpää, T., Laitinen, M., Sajavaara, T., Mizohata, K., Ritala, M. & Leskelä, M., 2016, In : Journal of Materials Chemistry. C. 4, 3, p. 449-454 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers

Puttaswamy, M., Vehkamäki, M., Kukli, K., Dimri, M. C., Kemell, M., Hatanpää, T., Heikkilä, M. J., Mizohata, K., Stern, R., Ritala, M. & Leskelä, M., 29 Jul 2016, In : Thin Solid Films. 611, p. 78-87 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Electric and Magnetic Properties of ALD-Grown BiFeO3 Films

Marchand, B., Jalkanen, P., Tuboltsev, V., Vehkamäki, M., Puttaswamy, M., Kemell, M., Mizohata, K., Hatanpää, T., Savin, A., Räisänen, J., Ritala, M. & Leskelä, M., 7 Apr 2016, In : Journal of Physical Chemistry C. 120, 13, p. 7313-7322 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Potential gold(I) precursors evaluated for atomic layer deposition

Mäkelä, M. I., Hatanpää, T. T., Ritala, M. K., Leskelä, M. A., Mizohata, K., Meinander, N. K. & Räisänen, J. A., 23 Nov 2016, In : Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films. 35, 1, 9 p., 01B112.

Research output: Contribution to journalArticleScientificpeer-review

2015

(Et3Si)(2)Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3

Sarnet, T., Hatanpaa, T., Vehkamaki, M., Flyktman, T., Ahopelto, J., Mizohata, K., Ritala, M. & Leskela, M., 2015, In : Journal of Materials Chemistry. C. 3, 18, p. 4820-4828 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition and Characterization of Bi2Te3 Thin Films

Sarnet, T., Hatanpaa, T., Puukilainen, E., Mattinen, M., Vehkamaki, M., Mizohata, K., Ritala, M. & Leskela, M., 19 Mar 2015, In : Journal of Physical Chemistry A. 119, 11, p. 2298-2306 9 p.

Research output: Contribution to journalArticleScientificpeer-review

2014

Magnetic Properties of Polycrystalline Bismuth Ferrite Thin Films Grown by Atomic Layer Deposition

Jalkanen, P., Tuboltsev, V., Marchand, B., Savin, A., Puttaswamy, M., Vehkamäki, M., Mizohata, K., Kemell, M. L., Hatanpää, T. T., Rogozin, V., Räisänen, J., Ritala, M. & Leskelä, M., 18 Dec 2014, In : Journal of Physical Chemistry Letters. 5, 24, p. 4319-4323 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2013

Bismuth(III) Alkoxide Catalysts for Ring-Opening Polymerization of Lactides and epsilon-Caprolactone

Vuorinen, S., Lahcini, M., Hatanpää, T., Sundberg, M., Leskelä, M. & Repo, T., 25 Mar 2013, In : Macromolecular Chemistry and Physics. 214, 6, p. 707-715 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Precursors as enablers of ALD technology: Contributions from University of Helsinki

Hatanpää, T. T., Ritala, M. & Leskelä, M., Dec 2013, In : Coordination Chemistry Reviews. 257, 23-24, p. 3297-3322 26 p.

Research output: Contribution to journalArticleScientificpeer-review

Programming nanostructured soft biological surfaces by atomic layer deposition

Szilagyi, I. M., Teucher, G., Härkönen, E., Färm, E., Hatanpää, T., Nikitin, T., Khriachtchev, L., Räsänen, M., Ritala, M. & Leskelä, M., 21 Jun 2013, In : Nanotechnology. 24, 24, 6 p.

Research output: Contribution to journalArticleScientificpeer-review

The effect of freeze-drying parameters and formulation composition on IgG stability during drying

Heljo, V. P., Harju, H., Hatanpää, T., Yohannes, G. & Juppo, A. M., Nov 2013, In : European Journal of Pharmaceutics and Biopharmaceutics. 85, 3, Part A, p. 752-755 4 p.

Research output: Contribution to journalArticleScientificpeer-review

2012

Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films

Niinisto, J., Hatanpää, T. T., Kariniemi, M., Mäntymäki, M., Costelle, L., Mizohata, K., Kukli, K., Ritala, M. & Leskelä, M., 2012, In : Chemistry of Materials. 24, 11, p. 2002-2008 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Lithium Phosphate Thin Films Grown by Atomic Layer Deposition

Hämäläinen, J., Holopainen, J., Munnik, F., Hatanpää, T., Heikkilä, M., Ritala, M. & Leskelä, M., 2012, In : Journal of the Electrochemical Society. 159, 3, p. A259-A263 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Study of amorphous lithium silicate thin films grown by atomic layer deposition

Hämäläinen, J., Munnik, F., Hatanpää, T., Holopainen, J., Ritala, M. & Leskelä, M., 2012, In : Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films. 30, 1, p. 01A106 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2011

Atomic Layer Deposition and Characterization of GeTe Thin Films

Sarnet, T., Pore, V., Hatanpää, T., Ritala, M., Leskelä, M., Schrott, A., Zhu, Y., Raoux, S. & Cheng, H-Y., 2011, In : Journal of the Electrochemical Society. 158, 12, p. D694-D697 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony

Pore, V., Knapas, K. J. P., Hatanpää, T. T., Sarnet, T., Kemell, M. L., Ritala, M., Leskelä, M. & Mizohata, K., 2011, In : Chemistry of Materials. 23, 2, p. 247-254 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Effects of spray drying on physicochemical properties of chitosan acid salts

Fernández Cervera, M., Heinämäki, J., de la Paz, N., López, O., Maunu, S. L., Virtanen, T., Hatanpää, T., Antikainen, O., Nogueira, A., Fundora, J. & Yliruusi, J., 2011, In : AAPS PharmSciTech. 12, 2, p. 637-649 13 p.

Research output: Contribution to journalArticleScientificpeer-review

Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures

Hämäläinen, J., Hatanpää, T. T., Puukilainen, E., Sajavaara, T., Ritala, M. & Leskelä, M., 2011, In : Journal of Materials Chemistry. 21, 41, p. 16488-16493 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars

Caldwell, J., Glembocki, O., Bezares, F., Kariniemi, M. I., Niinistö, J. T., Hatanpää, T. T., Rendell, R., Ukaegbu, M., Ritala, M. K., Prokes, S., Hosten, C., Leskelä, M. A. & Kasica, R., 7 Dec 2011, In : Optics Express. 19, 27, p. 26056-26064 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films

Kariniemi, M., Niinistö, J., Hatanpää, T., Kemell, M., Sajavaara, T., Ritala, M. & Leskelä, M., 2011, In : Chemistry of Materials. 23, 11, p. 2901-2907 7 p.

Research output: Contribution to journalArticleScientificpeer-review

2010

(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium

Hämäläinen, J., Hatanpää, T., Puukilainen, E., Costelle, L., Pilvi, T., Ritala, M. & Leskelä, M., 2010, In : Journal of Materials Chemistry. 20, 36, p. 7669-7675 7 p.

Research output: Contribution to journalArticleScientificpeer-review

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of Sb2Te3 and GeTe from (Et3Si)(2)Te and Chlorides

Knapas, K., Hatanpää, T., Ritala, M. & Leskelä, M., 2010, In : Chemistry of Materials. 22, 4, p. 1386-1391 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Study of bismuth alkoxides as possible precursors for ALD

Hatanpää, T., Vehkamäki, M., Ritala, M. & Leskelä, M., 2010, In : Dalton Transactions. 39, 13, p. 3219-3226 8 p.

Research output: Contribution to journalArticleScientificpeer-review

The Use of Disaccharides in Inhibiting Enzymatic Activity Loss and Secondary Structure Changes in Freeze-Dried B-Galactosidase during Storage

Heljo, P., Jouppila, K., Hatanpää, T. T. & Juppo, A., 22 Oct 2010, In : Pharmaceutical Research. 28, 3, p. 540-552 13 p.

Research output: Contribution to journalArticleScientificpeer-review

2009

Alkylsilyl compounds of selenium and tellurium: new precursors for ALD

Hatanpää, T., Pore, V., Ritala, M. & Leskelä, M., 2009, In : ECS transactions. 25, 8, p. 609-616 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of Ge₂Sb₂Te₅ thin films

Ritala, M., Pore, V., Hatanpää, T., Heikkilä, M., Leskelä, M., Mizohata, K., Schrott, A., Raoux, S. & Rossnagel, S. M., 2009, In : Microelectronic Engineering. 86, 7-9, p. 1946-1949 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of materials for phase-change memories

Leskelä, M., Pore, V., Hatanpää, T., Heikkilä, M., Ritala, M., Schrott, A., Raoux, S. & Rossnagel, S. M., 2009, In : ECS transactions. 25, 8, p. 399-407 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and selenium

Pore, V., Hatanpää, T., Ritala, M. & Leskelä, M., 2009, In : Journal of the American Chemical Society. 131, 10, p. 3478-3480 3 p.

Research output: Contribution to journalArticleScientificpeer-review

2008

Dielectric properties of atomic layer deposited thin-film barium strontium titanate

Tyunina, M., Plekh, M., Levoska, J., Vehkamäki, M., Hatanpää, T., Ritala, M. & Leskelä, M., 2008, In : Integrated Ferroelectrics. 102, p. 29-36 8 p.

Research output: Contribution to journalArticleScientificpeer-review

2007

Atomic layer deposition of BaTiO3 thin films - effect of barium hydroxide formation

Vehkamäki, M., Hatanpää, T., Ritala, M., Leskelä, M., Väyrynen, S. & Rauhala, E., 2007, In : Chemical Vapor Deposition. 13, 5, p. 239-246 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition of gadolinium oxide films

Kukli, K., Hatanpää, T., Ritala, M. & Leskelä, M., 2007, In : Chemical Vapor Deposition. 13, 10, p. 546-552 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Electrical properties of atomic-layer-deposition thin gadolinium oxide high-k gate dielectrics

Dueñas, S., Castán, H., Garcia, H., Gómez, A., Bailón, L., Kukli, K., Hatanpää, T., Lu, J., Ritala, M. & Leskelä, M., 2007, In : Journal of the Electrochemical Society. 154, 10, p. G207-G214

Research output: Contribution to journalArticleScientificpeer-review

Experimental observations of temperature-dependent flat band voltage transients on high-k dielectrics

Duenas, S., Castan, H., Garcia, H., Bailon, L., Kukli, K., Hatanpää, T., Ritala, M. & Leskelä, M., 2007, In : Microelectronics Reliability. 47, p. 653-656 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Radical-enhanced atomic layer deposition of silver thin films using phosphine-adducted silver carboxylates

Niskanen, A., Hatanpää, T., Arstila, K., Leskelä, M. & Ritala, M., 2007, In : Chemical Vapor Deposition. 13, 8, p. 408-413 6 p.

Research output: Contribution to journalArticleScientificpeer-review