A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(ii) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine

Anton Vihervaara; Timo Hatanpää; Kenichiro Mizohata; Mykhailo Chundak; Georgi Popov; Mikko Ritala

doi:10.1039/d2dt01347a

A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(ii) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine

Anton Vihervaara, Timo Hatanpää, Kenichiro Mizohata, Mykhailo Chundak, Georgi Popov, Mikko Ritala

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Journal	Dalton Transactions
Volume	51
Issue number	29
Pages (from-to)	10898-10908
Number of pages	11
ISSN	1477-9226
DOIs	https://doi.org/10.1039/d2dt01347a
Publication status	Published - 26 Jul 2022
MoE publication type	A1 Journal article-refereed

Fields of Science

116 Chemical sciences
216 Materials engineering

Access to Document

10.1039/d2dt01347aLicence: CC BY

d2dt01347aFinal published version, 2.98 MBLicence: CC BY

Cite this

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title = "A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(ii) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine",

keywords = "116 Chemical sciences, 216 Materials engineering",

author = "Anton Vihervaara and Timo Hatanp{\"a}{\"a} and Kenichiro Mizohata and Mykhailo Chundak and Georgi Popov and Mikko Ritala",

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AU - Vihervaara, Anton

AU - Hatanpää, Timo

AU - Mizohata, Kenichiro

AU - Chundak, Mykhailo

AU - Popov, Georgi

AU - Ritala, Mikko

PY - 2022/7/26

Y1 - 2022/7/26

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KW - 216 Materials engineering

U2 - 10.1039/d2dt01347a

DO - 10.1039/d2dt01347a

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JO - Dalton Transactions

JF - Dalton Transactions

SN - 1477-9226

IS - 29

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