A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of Ta2O5

Charles L Dezelah; Monika K Wiedmann; Kenichiro Mizohata; Ronald J Baird; Lauri Niinistö; Charles H Winter

doi:10.1021/ja074043s

A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of Ta2O5

Charles L Dezelah
, Monika K Wiedmann
, Kenichiro Mizohata
, Ronald J Baird
, Lauri Niinistö
, Charles H Winter

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Journal	Journal of the American Chemical Society
Volume	129
Issue number	41
Pages (from-to)	12370-12371
Number of pages	2
ISSN	0002-7863
DOIs	https://doi.org/10.1021/ja074043s
Publication status	Published - 2007
MoE publication type	A1 Journal article-refereed

Fields of Science

114 Physical sciences

Access to Document

10.1021/ja074043s

Cite this

@article{dbebae14806741848ec0878ca94defba,

title = "A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of Ta2O5",

keywords = "114 Physical sciences",

author = "Dezelah, \{Charles L\} and Wiedmann, \{Monika K\} and Kenichiro Mizohata and Baird, \{Ronald J\} and Lauri Niinist{\"o} and Winter, \{Charles H\}",

year = "2007",

doi = "10.1021/ja074043s",

language = "English",

volume = "129",

pages = "12370--12371",

journal = "Journal of the American Chemical Society",

issn = "0002-7863",

publisher = "American Chemical Society",

number = "41",

}

A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of Ta2O5. / Dezelah, Charles L; Wiedmann, Monika K; Mizohata, Kenichiro et al.
In: Journal of the American Chemical Society, Vol. 129, No. 41, 2007, p. 12370-12371.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of Ta2O5

AU - Dezelah, Charles L

AU - Wiedmann, Monika K

AU - Mizohata, Kenichiro

AU - Baird, Ronald J

AU - Niinistö, Lauri

AU - Winter, Charles H

PY - 2007

Y1 - 2007

KW - 114 Physical sciences

U2 - 10.1021/ja074043s

DO - 10.1021/ja074043s

M3 - Article

SN - 0002-7863

VL - 129

SP - 12370

EP - 12371

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 41

ER -