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Annealing behaviour of deuterium in silicon doped carbon films

  • J. Likonen
  • , E. Vainonen-Ahlgren
  • , T. Ahlgren
  • , S. Lehto
  • , T. Sajavaara
  • , W. Rydman
  • , J. Keinonen
  • , J. Katainen
  • , C.H. Wu

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageEnglish
    JournalContributions to plasma physics : CPP
    Volume42
    Issue number2-4
    Pages (from-to)445-450
    Number of pages6
    ISSN0863-1042
    DOIs
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed

    Fields of Science

    • HYDROGEN
    • GRAPHITE
    • REEMISSION
    • DIFFUSION
    • 114 Physical sciences

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