As2S3 thin films deposited by atomic layer deposition

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Article number01B114
JournalJournal of vacuum science & technology : an official journal of the American Vacuum Society
Volume35
Issue number1
Number of pages7
ISSN0734-2101
DOIs
Publication statusPublished - Jan 2017
MoE publication typeA1 Journal article-refereed

Fields of Science

  • CHEMICAL-VAPOR-DEPOSITION
  • ARSENIC SULFIDE
  • OPTICAL CHARACTERIZATION
  • WAVE-GUIDES
  • 114 Physical sciences
  • 116 Chemical sciences

Cite this

@article{e119bfd45ce04c7083443118a6802df6,
title = "As2S3 thin films deposited by atomic layer deposition",
keywords = "CHEMICAL-VAPOR-DEPOSITION, ARSENIC SULFIDE, OPTICAL CHARACTERIZATION, WAVE-GUIDES, 114 Physical sciences, 116 Chemical sciences",
author = "Elina F{\"a}rm and Heikkil{\"a}, {Mikko J.} and Marko Vehkam{\"a}ki and Kenichiro Mizohata and Mikko Ritala and Markku Leskel{\"a} and Marianna Kemell",
year = "2017",
month = "1",
doi = "10.1116/1.4968202",
language = "English",
volume = "35",
journal = "Journal of vacuum science & technology : an official journal of the American Vacuum Society",
issn = "0734-2101",
publisher = "AVS",
number = "1",

}

TY - JOUR

T1 - As2S3 thin films deposited by atomic layer deposition

AU - Färm, Elina

AU - Heikkilä, Mikko J.

AU - Vehkamäki, Marko

AU - Mizohata, Kenichiro

AU - Ritala, Mikko

AU - Leskelä, Markku

AU - Kemell, Marianna

PY - 2017/1

Y1 - 2017/1

KW - CHEMICAL-VAPOR-DEPOSITION

KW - ARSENIC SULFIDE

KW - OPTICAL CHARACTERIZATION

KW - WAVE-GUIDES

KW - 114 Physical sciences

KW - 116 Chemical sciences

U2 - 10.1116/1.4968202

DO - 10.1116/1.4968202

M3 - Article

VL - 35

JO - Journal of vacuum science & technology : an official journal of the American Vacuum Society

JF - Journal of vacuum science & technology : an official journal of the American Vacuum Society

SN - 0734-2101

IS - 1

M1 - 01B114

ER -