Atomic layer deposited protective layers

Research output: Contribution to journalConference articleScientificpeer-review

Abstract

This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings. In protective coatings oxides are the most common materials and especially Al, Ti, and Ta oxides have been applied. The use of nanolaminates enables improving the protection properties. Since ALD films are pinhole-free and often thin they are used to protect against moisture, radiation, out-gassing but not often against corrosion of metals. Very good moisture barriers are obtained with thin ALD oxide layers on polymers and cardboard. This property is also very attractive in encapsulation of OLEDs. In studies of energy technology materials protection of electrodes in Li-ion batteries, fuel cells and supercapacitors by ALD has been reported and significant improvement in the stability has been achieved. Yet another area is protection of silver jewelry from tarnishing by a thin oxide layer. In traditional corrosion protection of metals ALD films have proven to be useful in tailoring of interfaces and sealing of defects in coatings made by other techniques. © 2017 Trans Tech Publications, Switzerland.
Original languageEnglish
JournalMaterials Science Forum
Volume879
Pages (from-to)1086-1092
Number of pages7
ISSN0255-5476
DOIs
Publication statusPublished - 2017
MoE publication typeA4 Article in conference proceedings
Event International Conference on Processing and Manufacturing of Advanced Materials -
Duration: 29 May 20163 Jun 2016
Conference number: 9

Fields of Science

  • Aluminum coatings
  • Atoms
  • Coatings
  • Corrosion
  • Corrosion protection
  • Deposition
  • Fuel cells
  • Interfaces (materials)
  • Lithium-ion batteries
  • Moisture
  • Protective coatings
  • Tantalum oxides
  • Titanium oxides, Atomic layer deposited
  • Common materials
  • Corrosion coatings
  • Energy technologies
  • Moisture barriers
  • OLED
  • Protective layers
  • Thin oxide layers, Atomic layer deposition
  • 116 Chemical sciences

Cite this

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title = "Atomic layer deposited protective layers",
abstract = "This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings. In protective coatings oxides are the most common materials and especially Al, Ti, and Ta oxides have been applied. The use of nanolaminates enables improving the protection properties. Since ALD films are pinhole-free and often thin they are used to protect against moisture, radiation, out-gassing but not often against corrosion of metals. Very good moisture barriers are obtained with thin ALD oxide layers on polymers and cardboard. This property is also very attractive in encapsulation of OLEDs. In studies of energy technology materials protection of electrodes in Li-ion batteries, fuel cells and supercapacitors by ALD has been reported and significant improvement in the stability has been achieved. Yet another area is protection of silver jewelry from tarnishing by a thin oxide layer. In traditional corrosion protection of metals ALD films have proven to be useful in tailoring of interfaces and sealing of defects in coatings made by other techniques. {\circledC} 2017 Trans Tech Publications, Switzerland.",
keywords = "Aluminum coatings, Atoms, Coatings, Corrosion, Corrosion protection, Deposition, Fuel cells, Interfaces (materials), Lithium-ion batteries, Moisture, Protective coatings, Tantalum oxides, Titanium oxides, Atomic layer deposited, Common materials, Corrosion coatings, Energy technologies, Moisture barriers, OLED, Protective layers, Thin oxide layers, Atomic layer deposition, 116 Chemical sciences",
author = "M. Leskel{\"a} and E. Salmi and M. Ritala",
year = "2017",
doi = "10.4028/www.scientific.net/MSF.879.1086",
language = "English",
volume = "879",
pages = "1086--1092",
journal = "Materials Science Forum",
issn = "0255-5476",
publisher = "Trans Tech Publications Ltd",

}

Atomic layer deposited protective layers. / Leskelä, M.; Salmi, E.; Ritala, M.

In: Materials Science Forum, Vol. 879, 2017, p. 1086-1092.

Research output: Contribution to journalConference articleScientificpeer-review

TY - JOUR

T1 - Atomic layer deposited protective layers

AU - Leskelä, M.

AU - Salmi, E.

AU - Ritala, M.

PY - 2017

Y1 - 2017

N2 - This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings. In protective coatings oxides are the most common materials and especially Al, Ti, and Ta oxides have been applied. The use of nanolaminates enables improving the protection properties. Since ALD films are pinhole-free and often thin they are used to protect against moisture, radiation, out-gassing but not often against corrosion of metals. Very good moisture barriers are obtained with thin ALD oxide layers on polymers and cardboard. This property is also very attractive in encapsulation of OLEDs. In studies of energy technology materials protection of electrodes in Li-ion batteries, fuel cells and supercapacitors by ALD has been reported and significant improvement in the stability has been achieved. Yet another area is protection of silver jewelry from tarnishing by a thin oxide layer. In traditional corrosion protection of metals ALD films have proven to be useful in tailoring of interfaces and sealing of defects in coatings made by other techniques. © 2017 Trans Tech Publications, Switzerland.

AB - This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings. In protective coatings oxides are the most common materials and especially Al, Ti, and Ta oxides have been applied. The use of nanolaminates enables improving the protection properties. Since ALD films are pinhole-free and often thin they are used to protect against moisture, radiation, out-gassing but not often against corrosion of metals. Very good moisture barriers are obtained with thin ALD oxide layers on polymers and cardboard. This property is also very attractive in encapsulation of OLEDs. In studies of energy technology materials protection of electrodes in Li-ion batteries, fuel cells and supercapacitors by ALD has been reported and significant improvement in the stability has been achieved. Yet another area is protection of silver jewelry from tarnishing by a thin oxide layer. In traditional corrosion protection of metals ALD films have proven to be useful in tailoring of interfaces and sealing of defects in coatings made by other techniques. © 2017 Trans Tech Publications, Switzerland.

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KW - Atoms

KW - Coatings

KW - Corrosion

KW - Corrosion protection

KW - Deposition

KW - Fuel cells

KW - Interfaces (materials)

KW - Lithium-ion batteries

KW - Moisture

KW - Protective coatings

KW - Tantalum oxides

KW - Titanium oxides, Atomic layer deposited

KW - Common materials

KW - Corrosion coatings

KW - Energy technologies

KW - Moisture barriers

KW - OLED

KW - Protective layers

KW - Thin oxide layers, Atomic layer deposition

KW - 116 Chemical sciences

U2 - 10.4028/www.scientific.net/MSF.879.1086

DO - 10.4028/www.scientific.net/MSF.879.1086

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