Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

Kaupo Kukli, Marianna Kemell, Helena Castan, Salvador Duenas, Helina Seemen, Mihkel Rähn, Joosep Link, Raivo Stern, Mikko J. Heikkilä, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalECS Journal of Solid State Science and Technology
Volume7
Issue number5
Pages (from-to)P287-P294
Number of pages8
ISSN2162-8769
DOIs
Publication statusPublished - 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • ROOM-TEMPERATURE FERROMAGNETISM
  • ZRO2 NANOSTRUCTURES
  • RRAM DEVICES
  • ENCAPSULATION
  • CAPACITORS
  • EPITAXY
  • ALUMINA
  • GROWTH
  • 221 Nano-technology
  • 116 Chemical sciences

Cite this

Kukli, Kaupo ; Kemell, Marianna ; Castan, Helena ; Duenas, Salvador ; Seemen, Helina ; Rähn, Mihkel ; Link, Joosep ; Stern, Raivo ; Heikkilä, Mikko J. ; Ritala, Mikko ; Leskelä, Markku. / Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films. In: ECS Journal of Solid State Science and Technology. 2018 ; Vol. 7, No. 5. pp. P287-P294.
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author = "Kaupo Kukli and Marianna Kemell and Helena Castan and Salvador Duenas and Helina Seemen and Mihkel R{\"a}hn and Joosep Link and Raivo Stern and Heikkil{\"a}, {Mikko J.} and Mikko Ritala and Markku Leskel{\"a}",
year = "2018",
doi = "10.1149/2.0021806jss",
language = "English",
volume = "7",
pages = "P287--P294",
journal = "ECS Journal of Solid State Science and Technology",
issn = "2162-8769",
publisher = "ELECTROCHEMICAL SOC INC",
number = "5",

}

Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films. / Kukli, Kaupo; Kemell, Marianna; Castan, Helena; Duenas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko J.; Ritala, Mikko; Leskelä, Markku.

In: ECS Journal of Solid State Science and Technology, Vol. 7, No. 5, 2018, p. P287-P294.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

AU - Kukli, Kaupo

AU - Kemell, Marianna

AU - Castan, Helena

AU - Duenas, Salvador

AU - Seemen, Helina

AU - Rähn, Mihkel

AU - Link, Joosep

AU - Stern, Raivo

AU - Heikkilä, Mikko J.

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2018

Y1 - 2018

KW - ROOM-TEMPERATURE FERROMAGNETISM

KW - ZRO2 NANOSTRUCTURES

KW - RRAM DEVICES

KW - ENCAPSULATION

KW - CAPACITORS

KW - EPITAXY

KW - ALUMINA

KW - GROWTH

KW - 221 Nano-technology

KW - 116 Chemical sciences

U2 - 10.1149/2.0021806jss

DO - 10.1149/2.0021806jss

M3 - Article

VL - 7

SP - P287-P294

JO - ECS Journal of Solid State Science and Technology

JF - ECS Journal of Solid State Science and Technology

SN - 2162-8769

IS - 5

ER -