Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

Kaupo Kukli, Marianna Kemell, Helena Castan, Salvador Duenas, Helina Seemen, Mihkel Rähn, Joosep Link, Raivo Stern, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalECS Journal of Solid State Science and Technology
Volume7
Issue number9
Pages (from-to)P501-P508
Number of pages8
ISSN2162-8769
DOIs
Publication statusPublished - 6 Sep 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • HFO2 THIN-FILMS
  • ELECTRICAL-PROPERTIES
  • DIELECTRIC-PROPERTIES
  • HAFNIUM OXIDE
  • MEMORY
  • 116 Chemical sciences
  • 221 Nano-technology

Cite this

Kukli, Kaupo ; Kemell, Marianna ; Castan, Helena ; Duenas, Salvador ; Seemen, Helina ; Rähn, Mihkel ; Link, Joosep ; Stern, Raivo ; Ritala, Mikko ; Leskelä, Markku. / Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates. In: ECS Journal of Solid State Science and Technology. 2018 ; Vol. 7, No. 9. pp. P501-P508.
@article{3fb71447f94346418221e326c92803d5,
title = "Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates",
keywords = "HFO2 THIN-FILMS, ELECTRICAL-PROPERTIES, DIELECTRIC-PROPERTIES, HAFNIUM OXIDE, MEMORY, 116 Chemical sciences, 221 Nano-technology",
author = "Kaupo Kukli and Marianna Kemell and Helena Castan and Salvador Duenas and Helina Seemen and Mihkel R{\"a}hn and Joosep Link and Raivo Stern and Mikko Ritala and Markku Leskel{\"a}",
year = "2018",
month = "9",
day = "6",
doi = "10.1149/2.0261809jss",
language = "English",
volume = "7",
pages = "P501--P508",
journal = "ECS Journal of Solid State Science and Technology",
issn = "2162-8769",
publisher = "ELECTROCHEMICAL SOC INC",
number = "9",

}

Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates. / Kukli, Kaupo; Kemell, Marianna; Castan, Helena; Duenas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku.

In: ECS Journal of Solid State Science and Technology, Vol. 7, No. 9, 06.09.2018, p. P501-P508.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

AU - Kukli, Kaupo

AU - Kemell, Marianna

AU - Castan, Helena

AU - Duenas, Salvador

AU - Seemen, Helina

AU - Rähn, Mihkel

AU - Link, Joosep

AU - Stern, Raivo

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2018/9/6

Y1 - 2018/9/6

KW - HFO2 THIN-FILMS

KW - ELECTRICAL-PROPERTIES

KW - DIELECTRIC-PROPERTIES

KW - HAFNIUM OXIDE

KW - MEMORY

KW - 116 Chemical sciences

KW - 221 Nano-technology

U2 - 10.1149/2.0261809jss

DO - 10.1149/2.0261809jss

M3 - Article

VL - 7

SP - P501-P508

JO - ECS Journal of Solid State Science and Technology

JF - ECS Journal of Solid State Science and Technology

SN - 2162-8769

IS - 9

ER -