Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films

Mikko Kaipio, Timothee Blanquart, Yoann Tomczak, Jaakko Niinisto, Marco Gavagnin, Valentino Longo, Heinz D. Wanzenboeck, Venkateswara R. Pallem, Christian Dussarrat, Esa Puukilainen, Mikko Ritala, Markku Leskela

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalLangmuir
Volume30
Issue number25
Pages (from-to)7395-7404
Number of pages10
ISSN0743-7463
DOIs
Publication statusPublished - 1 Jul 2014
MoE publication typeA1 Journal article-refereed

Fields of Science

  • IN-SITU
  • PRECURSOR
  • EPITAXY
  • PHOTOCATALYSIS
  • TRANSFORMATION
  • GENERATION
  • MORPHOLOGY
  • SURFACES
  • OXIDANT
  • ANATASE
  • 116 Chemical sciences

Cite this

Kaipio, Mikko ; Blanquart, Timothee ; Tomczak, Yoann ; Niinisto, Jaakko ; Gavagnin, Marco ; Longo, Valentino ; Wanzenboeck, Heinz D. ; Pallem, Venkateswara R. ; Dussarrat, Christian ; Puukilainen, Esa ; Ritala, Mikko ; Leskela, Markku. / Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films. In: Langmuir. 2014 ; Vol. 30, No. 25. pp. 7395-7404.
@article{d38ca91e9bf34d0bb71d1f68166e5283,
title = "Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films",
keywords = "IN-SITU, PRECURSOR, EPITAXY, PHOTOCATALYSIS, TRANSFORMATION, GENERATION, MORPHOLOGY, SURFACES, OXIDANT, ANATASE, 116 Chemical sciences",
author = "Mikko Kaipio and Timothee Blanquart and Yoann Tomczak and Jaakko Niinisto and Marco Gavagnin and Valentino Longo and Wanzenboeck, {Heinz D.} and Pallem, {Venkateswara R.} and Christian Dussarrat and Esa Puukilainen and Mikko Ritala and Markku Leskela",
year = "2014",
month = "7",
day = "1",
doi = "10.1021/la500893u",
language = "English",
volume = "30",
pages = "7395--7404",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "25",

}

Kaipio, M, Blanquart, T, Tomczak, Y, Niinisto, J, Gavagnin, M, Longo, V, Wanzenboeck, HD, Pallem, VR, Dussarrat, C, Puukilainen, E, Ritala, M & Leskela, M 2014, 'Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films', Langmuir, vol. 30, no. 25, pp. 7395-7404. https://doi.org/10.1021/la500893u

Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films. / Kaipio, Mikko; Blanquart, Timothee; Tomczak, Yoann; Niinisto, Jaakko; Gavagnin, Marco; Longo, Valentino; Wanzenboeck, Heinz D.; Pallem, Venkateswara R.; Dussarrat, Christian; Puukilainen, Esa; Ritala, Mikko; Leskela, Markku.

In: Langmuir, Vol. 30, No. 25, 01.07.2014, p. 7395-7404.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films

AU - Kaipio, Mikko

AU - Blanquart, Timothee

AU - Tomczak, Yoann

AU - Niinisto, Jaakko

AU - Gavagnin, Marco

AU - Longo, Valentino

AU - Wanzenboeck, Heinz D.

AU - Pallem, Venkateswara R.

AU - Dussarrat, Christian

AU - Puukilainen, Esa

AU - Ritala, Mikko

AU - Leskela, Markku

PY - 2014/7/1

Y1 - 2014/7/1

KW - IN-SITU

KW - PRECURSOR

KW - EPITAXY

KW - PHOTOCATALYSIS

KW - TRANSFORMATION

KW - GENERATION

KW - MORPHOLOGY

KW - SURFACES

KW - OXIDANT

KW - ANATASE

KW - 116 Chemical sciences

U2 - 10.1021/la500893u

DO - 10.1021/la500893u

M3 - Article

VL - 30

SP - 7395

EP - 7404

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 25

ER -

Kaipio M, Blanquart T, Tomczak Y, Niinisto J, Gavagnin M, Longo V et al. Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films. Langmuir. 2014 Jul 1;30(25):7395-7404. https://doi.org/10.1021/la500893u