Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

Miika Mattinen, Peter J. King, Leonid Khriachtchev, Mikko J. Heikkilä, Ben Fleming, Simon Rushworth, Kenichiro Mizohata, Kristoffer Meinander, Jyrki Räisänen, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalMaterials today chemistry
Volume9
Pages (from-to)17-27
Number of pages11
ISSN2468-5194
DOIs
Publication statusPublished - Sep 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • Atomic layer deposition
  • Molybdenum oxide
  • MoO
  • Thin films
  • MoO2
  • REVERSIBLE LITHIUM STORAGE
  • MoO3
  • SELECTIVE OXIDATION
  • MOO3
  • RAMAN-SPECTROSCOPY
  • PHOTOCHROMISM
  • ELECTRODES
  • TEMPERATURE
  • GROWTH
  • PRECURSORS
  • CATALYSTS
  • 116 Chemical sciences
  • 114 Physical sciences

Cite this

@article{bc1167b255924061a8d4d97add92735e,
title = "Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing",
keywords = "Atomic layer deposition, Molybdenum oxide, MoO, Thin films, MoO2, REVERSIBLE LITHIUM STORAGE, MoO3, SELECTIVE OXIDATION, MOO3, RAMAN-SPECTROSCOPY, PHOTOCHROMISM, ELECTRODES, TEMPERATURE, GROWTH, PRECURSORS, CATALYSTS, 116 Chemical sciences, 114 Physical sciences",
author = "Miika Mattinen and King, {Peter J.} and Leonid Khriachtchev and Heikkil{\"a}, {Mikko J.} and Ben Fleming and Simon Rushworth and Kenichiro Mizohata and Kristoffer Meinander and Jyrki R{\"a}is{\"a}nen and Mikko Ritala and Markku Leskel{\"a}",
year = "2018",
month = "9",
doi = "10.1016/j.mtchem.2018.04.005",
language = "English",
volume = "9",
pages = "17--27",
journal = "Materials today chemistry",
issn = "2468-5194",
publisher = "ELSEVIER SCI IRELAND LTD",

}

Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing. / Mattinen, Miika; King, Peter J.; Khriachtchev, Leonid; Heikkilä, Mikko J.; Fleming, Ben; Rushworth, Simon; Mizohata, Kenichiro; Meinander, Kristoffer; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku.

In: Materials today chemistry, Vol. 9, 09.2018, p. 17-27.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

AU - Mattinen, Miika

AU - King, Peter J.

AU - Khriachtchev, Leonid

AU - Heikkilä, Mikko J.

AU - Fleming, Ben

AU - Rushworth, Simon

AU - Mizohata, Kenichiro

AU - Meinander, Kristoffer

AU - Räisänen, Jyrki

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2018/9

Y1 - 2018/9

KW - Atomic layer deposition

KW - Molybdenum oxide

KW - MoO

KW - Thin films

KW - MoO2

KW - REVERSIBLE LITHIUM STORAGE

KW - MoO3

KW - SELECTIVE OXIDATION

KW - MOO3

KW - RAMAN-SPECTROSCOPY

KW - PHOTOCHROMISM

KW - ELECTRODES

KW - TEMPERATURE

KW - GROWTH

KW - PRECURSORS

KW - CATALYSTS

KW - 116 Chemical sciences

KW - 114 Physical sciences

U2 - 10.1016/j.mtchem.2018.04.005

DO - 10.1016/j.mtchem.2018.04.005

M3 - Article

VL - 9

SP - 17

EP - 27

JO - Materials today chemistry

JF - Materials today chemistry

SN - 2468-5194

ER -