Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Miika Mattinen; Georgi Popov; Marko Vehkamäki; Peter J. King; Kenichiro Mizohata; Pasi Jalkanen; Jyrki Räisänen; Markku Leskelä; Mikko Ritala

doi:10.1021/acs.chemmater.9b01688

Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Miika Mattinen, Georgi Popov, Marko Vehkamäki, Peter J. King, Kenichiro Mizohata, Pasi Jalkanen, Jyrki Räisänen, Markku Leskelä, Mikko Ritala

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Journal	Chemistry of Materials
Volume	31
Issue number	15
Pages (from-to)	5713-5724
Number of pages	12
ISSN	0897-4756
DOIs	https://doi.org/10.1021/acs.chemmater.9b01688
Publication status	Published - 13 Aug 2019
MoE publication type	A1 Journal article-refereed

Fields of Science

OXIDE THIN-FILMS
TRANSISTORS
CARBON
116 Chemical sciences

Access to Document

10.1021/acs.chemmater.9b01688

acs.chemmater.9b01688Final published version, 4.13 MBLicence: CC BY

HelsinkiALD
Putkonen, M. (Manager), Ritala, M. (Manager), Mäntymäki, M. (Operator), Kemell, M. (Operator), Vehkamäki, M. (Operator) & Heikkilä, M. (Operator)
Department of Chemistry
Facility/equipment: Research Laboratory

Cite this

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title = "Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics",

keywords = "OXIDE THIN-FILMS, TRANSISTORS, CARBON, 116 Chemical sciences",

author = "Miika Mattinen and Georgi Popov and Marko Vehkam{\"a}ki and King, \{Peter J.\} and Kenichiro Mizohata and Pasi Jalkanen and Jyrki R{\"a}is{\"a}nen and Markku Leskel{\"a} and Mikko Ritala",

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T1 - Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

AU - Mattinen, Miika

AU - Popov, Georgi

AU - Vehkamäki, Marko

AU - King, Peter J.

AU - Mizohata, Kenichiro

AU - Jalkanen, Pasi

AU - Räisänen, Jyrki

AU - Leskelä, Markku

AU - Ritala, Mikko

PY - 2019/8/13

Y1 - 2019/8/13

KW - OXIDE THIN-FILMS

KW - TRANSISTORS

KW - CARBON

KW - 116 Chemical sciences

U2 - 10.1021/acs.chemmater.9b01688

DO - 10.1021/acs.chemmater.9b01688

M3 - Article

SN - 0897-4756

VL - 31

SP - 5713

EP - 5724

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 15

ER -

Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Fields of Science

Access to Document

Equipment

HelsinkiALD

Cite this