Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Films

Katja Väyrynen, Timo Hatanpää, Miika Mattinen, Kenichiro Mizohata, Kristoffer Meinander, Jyrki Räisänen, Joosep Link, Raivo Stern, Mikko Ritala, Markku Leskela

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Article number1801291
JournalAdvanced Materials Interfaces
Volume6
Issue number3
Number of pages7
ISSN2196-7350
DOIs
Publication statusPublished - 8 Feb 2019
MoE publication typeA1 Journal article-refereed

Fields of Science

  • atomic layer deposition
  • Co3Sn2
  • intermetallics
  • Ni3Sn2
  • thin films
  • ELECTROCHEMICAL PERFORMANCE
  • CATALYTIC-PROPERTIES
  • DIFFUSION BARRIER
  • TIN-OXIDE
  • LITHIUM
  • ALLOY
  • SUPERCONDUCTIVITY
  • NANOPARTICLES
  • NANOALLOYS
  • ELECTRODES
  • 221 Nano-technology
  • 116 Chemical sciences
  • 114 Physical sciences

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