Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source

Petri Räisänen, Kaupo Kukli, Antti Rahtu, Mikko Ritala, Markku Leskelä

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationChemical vapor deposition XV
    PublisherThe Electrochemical Society
    Publication date2000
    Pages623-628
    ISBN (Print)1566772788
    Publication statusPublished - 2000
    MoE publication typeA4 Article in conference proceedings

    Publication series

    NameElectrochemical Society Proceedings

    Fields of Science

    • 116 Chemical sciences

    Cite this

    Räisänen, P., Kukli, K., Rahtu, A., Ritala, M., & Leskelä, M. (2000). Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source. In Chemical vapor deposition XV (pp. 623-628 ). (Electrochemical Society Proceedings). The Electrochemical Society .
    Räisänen, Petri ; Kukli, Kaupo ; Rahtu, Antti ; Ritala, Mikko ; Leskelä, Markku. / Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source. Chemical vapor deposition XV . The Electrochemical Society , 2000. pp. 623-628 (Electrochemical Society Proceedings).
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    title = "Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source",
    keywords = "116 Chemical sciences",
    author = "Petri R{\"a}is{\"a}nen and Kaupo Kukli and Antti Rahtu and Mikko Ritala and Markku Leskel{\"a}",
    note = "Volume: Proceeding volume:",
    year = "2000",
    language = "English",
    isbn = "1566772788",
    series = "Electrochemical Society Proceedings",
    publisher = "The Electrochemical Society",
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    booktitle = "Chemical vapor deposition XV",
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    Räisänen, P, Kukli, K, Rahtu, A, Ritala, M & Leskelä, M 2000, Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source. in Chemical vapor deposition XV . Electrochemical Society Proceedings, The Electrochemical Society , pp. 623-628 .

    Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source. / Räisänen, Petri; Kukli, Kaupo; Rahtu, Antti; Ritala, Mikko; Leskelä, Markku.

    Chemical vapor deposition XV . The Electrochemical Society , 2000. p. 623-628 (Electrochemical Society Proceedings).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    TY - GEN

    T1 - Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source

    AU - Räisänen, Petri

    AU - Kukli, Kaupo

    AU - Rahtu, Antti

    AU - Ritala, Mikko

    AU - Leskelä, Markku

    N1 - Volume: Proceeding volume:

    PY - 2000

    Y1 - 2000

    KW - 116 Chemical sciences

    M3 - Conference contribution

    SN - 1566772788

    T3 - Electrochemical Society Proceedings

    SP - 623

    EP - 628

    BT - Chemical vapor deposition XV

    PB - The Electrochemical Society

    ER -

    Räisänen P, Kukli K, Rahtu A, Ritala M, Leskelä M. Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source. In Chemical vapor deposition XV . The Electrochemical Society . 2000. p. 623-628 . (Electrochemical Society Proceedings).