Atomic layer deposition of metal oxide films by using metal alkoxides as an oxygen source

Petri Räisänen, Kaupo Kukli, Antti Rahtu, Mikko Ritala, Markku Leskelä

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationChemical vapor deposition XV
    PublisherThe Electrochemical Society
    Publication date2000
    Pages623-628
    ISBN (Print)1566772788
    Publication statusPublished - 2000
    MoE publication typeA4 Article in conference proceedings

    Publication series

    NameElectrochemical Society Proceedings

    Fields of Science

    • 116 Chemical sciences

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