Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties

Miika Mattinen, Jan-Lucas Wree, Niklas Stegmann, Engin Ciftyurek, Mhamed El Achhab, Peter J. King, Kenichiro Mizohata, Jyrki Räisänen, Klaus D. Schierbaum, Anjana Devi, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalChemistry of Materials
Volume30
Issue number23
Pages (from-to)8690-8701
Number of pages12
ISSN0897-4756
DOIs
Publication statusPublished - 11 Dec 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • TRANSITION-METAL OXIDE
  • CRYSTAL-CHEMISTRY
  • OXIDATION-STATE
  • HYDROGENATION
  • WO3
  • MORPHOLOGY
  • COMPLEXES
  • CATALYSTS
  • SENSORS
  • SINGLE
  • 116 Chemical sciences
  • 114 Physical sciences
  • 221 Nano-technology

Cite this

@article{d67670f558f34ec8b93c9542f0d2596e,
title = "Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties",
keywords = "TRANSITION-METAL OXIDE, CRYSTAL-CHEMISTRY, OXIDATION-STATE, HYDROGENATION, WO3, MORPHOLOGY, COMPLEXES, CATALYSTS, SENSORS, SINGLE, 116 Chemical sciences, 114 Physical sciences, 221 Nano-technology",
author = "Miika Mattinen and Jan-Lucas Wree and Niklas Stegmann and Engin Ciftyurek and {El Achhab}, Mhamed and King, {Peter J.} and Kenichiro Mizohata and Jyrki R{\"a}is{\"a}nen and Schierbaum, {Klaus D.} and Anjana Devi and Mikko Ritala and Markku Leskel{\"a}",
year = "2018",
month = "12",
day = "11",
doi = "10.1021/acs.chemmater.8b04129",
language = "English",
volume = "30",
pages = "8690--8701",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society Journals",
number = "23",

}

Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors : Process Development, Film Characterization, and Gas Sensing Properties. / Mattinen, Miika; Wree, Jan-Lucas; Stegmann, Niklas; Ciftyurek, Engin; El Achhab, Mhamed; King, Peter J.; Mizohata, Kenichiro; Räisänen, Jyrki; Schierbaum, Klaus D.; Devi, Anjana; Ritala, Mikko; Leskelä, Markku.

In: Chemistry of Materials, Vol. 30, No. 23, 11.12.2018, p. 8690-8701.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors

T2 - Process Development, Film Characterization, and Gas Sensing Properties

AU - Mattinen, Miika

AU - Wree, Jan-Lucas

AU - Stegmann, Niklas

AU - Ciftyurek, Engin

AU - El Achhab, Mhamed

AU - King, Peter J.

AU - Mizohata, Kenichiro

AU - Räisänen, Jyrki

AU - Schierbaum, Klaus D.

AU - Devi, Anjana

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2018/12/11

Y1 - 2018/12/11

KW - TRANSITION-METAL OXIDE

KW - CRYSTAL-CHEMISTRY

KW - OXIDATION-STATE

KW - HYDROGENATION

KW - WO3

KW - MORPHOLOGY

KW - COMPLEXES

KW - CATALYSTS

KW - SENSORS

KW - SINGLE

KW - 116 Chemical sciences

KW - 114 Physical sciences

KW - 221 Nano-technology

U2 - 10.1021/acs.chemmater.8b04129

DO - 10.1021/acs.chemmater.8b04129

M3 - Article

VL - 30

SP - 8690

EP - 8701

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 23

ER -