Atomic layer deposition of TbF3 thin films

Elisa Atosuo; Juha Ojala; Mikko J. Heikkila; Miika Mattinen; Kenichiro Mizohata; Jyrki Raisanen; Markku Leskela; Mikko Ritala

doi:10.1116/6.0000790

Atomic layer deposition of TbF3 thin films

Elisa Atosuo, Juha Ojala, Mikko J. Heikkila, Miika Mattinen, Kenichiro Mizohata, Jyrki Raisanen, Markku Leskela, Mikko Ritala

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Article number	022404
Journal	Journal of vacuum science & technology : an official journal of the American Vacuum Society
Volume	39
Issue number	2
Number of pages	7
ISSN	0734-2101
DOIs	https://doi.org/10.1116/6.0000790
Publication status	Published - Mar 2021
MoE publication type	A1 Journal article-refereed

Fields of Science

114 Physical sciences
116 Chemical sciences

Access to Document

10.1116/6.0000790

Atomic layer deposition of TbF3 thin films (archive)Accepted author manuscript, 874 KB

HelsinkiALD
Matti Putkonen (Manager), Mikko Ritala (Manager), Miia Mäntymäki (Operator), Marianna Kemell (Operator), Marko Vehkamäki (Operator) & Mikko Heikkilä (Operator)
Department of Chemistry
Facility/equipment: Research Laboratory

Cite this

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title = "Atomic layer deposition of TbF3 thin films",

keywords = "114 Physical sciences, 116 Chemical sciences",

author = "Elisa Atosuo and Juha Ojala and Heikkila, {Mikko J.} and Miika Mattinen and Kenichiro Mizohata and Jyrki Raisanen and Markku Leskela and Mikko Ritala",

year = "2021",

month = mar,

doi = "10.1116/6.0000790",

language = "English",

volume = "39",

journal = "Journal of vacuum science & technology : an official journal of the American Vacuum Society",

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T1 - Atomic layer deposition of TbF3 thin films

AU - Atosuo, Elisa

AU - Ojala, Juha

AU - Heikkila, Mikko J.

AU - Mattinen, Miika

AU - Mizohata, Kenichiro

AU - Raisanen, Jyrki

AU - Leskela, Markku

AU - Ritala, Mikko

PY - 2021/3

Y1 - 2021/3

KW - 114 Physical sciences

KW - 116 Chemical sciences

U2 - 10.1116/6.0000790

DO - 10.1116/6.0000790

M3 - Article

SN - 0734-2101

VL - 39

JO - Journal of vacuum science & technology : an official journal of the American Vacuum Society

JF - Journal of vacuum science & technology : an official journal of the American Vacuum Society

IS - 2

M1 - 022404

ER -

Atomic layer deposition of TbF3 thin films

Fields of Science

Access to Document

Equipment

HelsinkiALD

Cite this