Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors

Mikko Kaipio, Timothee Blanquart, Manish Banerjee, Ke Xu, Jaakko Niinistö, Valentino Longo, Kenichiro Mizohata, Anjana Devi, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalChemical Vapor Deposition
Volume20
Issue number7-9
Pages (from-to)209-216
Number of pages8
ISSN0948-1907
DOIs
Publication statusPublished - Sep 2014
MoE publication typeA1 Journal article-refereed

Fields of Science

  • ALD
  • Guanidinate
  • Heteroleptic
  • Titanium dioxide (TiO2)
  • Zirconium dioxide (ZrO2)
  • HAFNIUM
  • GROWTH
  • OXIDES
  • GD2O3
  • HFO2
  • 116 Chemical sciences

Cite this

Kaipio, Mikko ; Blanquart, Timothee ; Banerjee, Manish ; Xu, Ke ; Niinistö, Jaakko ; Longo, Valentino ; Mizohata, Kenichiro ; Devi, Anjana ; Ritala, Mikko ; Leskelä, Markku. / Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors. In: Chemical Vapor Deposition. 2014 ; Vol. 20, No. 7-9. pp. 209-216.
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keywords = "ALD, Guanidinate, Heteroleptic, Titanium dioxide (TiO2), Zirconium dioxide (ZrO2), HAFNIUM, GROWTH, OXIDES, GD2O3, HFO2, 116 Chemical sciences",
author = "Mikko Kaipio and Timothee Blanquart and Manish Banerjee and Ke Xu and Jaakko Niinist{\"o} and Valentino Longo and Kenichiro Mizohata and Anjana Devi and Mikko Ritala and Markku Leskel{\"a}",
year = "2014",
month = "9",
doi = "10.1002/cvde.201407115",
language = "English",
volume = "20",
pages = "209--216",
journal = "Chemical Vapor Deposition",
issn = "0948-1907",
publisher = "Wiley-VCH",
number = "7-9",

}

Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors. / Kaipio, Mikko; Blanquart, Timothee; Banerjee, Manish; Xu, Ke; Niinistö, Jaakko; Longo, Valentino; Mizohata, Kenichiro; Devi, Anjana; Ritala, Mikko; Leskelä, Markku.

In: Chemical Vapor Deposition, Vol. 20, No. 7-9, 09.2014, p. 209-216.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors

AU - Kaipio, Mikko

AU - Blanquart, Timothee

AU - Banerjee, Manish

AU - Xu, Ke

AU - Niinistö, Jaakko

AU - Longo, Valentino

AU - Mizohata, Kenichiro

AU - Devi, Anjana

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2014/9

Y1 - 2014/9

KW - ALD

KW - Guanidinate

KW - Heteroleptic

KW - Titanium dioxide (TiO2)

KW - Zirconium dioxide (ZrO2)

KW - HAFNIUM

KW - GROWTH

KW - OXIDES

KW - GD2O3

KW - HFO2

KW - 116 Chemical sciences

U2 - 10.1002/cvde.201407115

DO - 10.1002/cvde.201407115

M3 - Article

VL - 20

SP - 209

EP - 216

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

SN - 0948-1907

IS - 7-9

ER -