Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors

Mikko Kaipio, Timothee Blanquart, Manish Banerjee, Ke Xu, Jaakko Niinistö, Valentino Longo, Kenichiro Mizohata, Anjana Devi, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalChemical Vapor Deposition
Volume20
Issue number7-9
Pages (from-to)209-216
Number of pages8
ISSN0948-1907
DOIs
Publication statusPublished - Sep 2014
MoE publication typeA1 Journal article-refereed

Fields of Science

  • ALD
  • Guanidinate
  • Heteroleptic
  • Titanium dioxide (TiO2)
  • Zirconium dioxide (ZrO2)
  • HAFNIUM
  • GROWTH
  • OXIDES
  • GD2O3
  • HFO2
  • 116 Chemical sciences

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