@article{f0430721f1ca4cb6bb7e874f8aed2f5a,
title = "Atomic Layer Deposition of TiO2 and ZrO2 Thin Films Using Heteroleptic Guanidinate Precursors",
keywords = "ALD, Guanidinate, Heteroleptic, Titanium dioxide (TiO2), Zirconium dioxide (ZrO2), HAFNIUM, GROWTH, OXIDES, GD2O3, HFO2, 116 Chemical sciences",
author = "Mikko Kaipio and Timothee Blanquart and Manish Banerjee and Ke Xu and Jaakko Niinist{\"o} and Valentino Longo and Kenichiro Mizohata and Anjana Devi and Mikko Ritala and Markku Leskel{\"a}",
year = "2014",
month = sep,
doi = "10.1002/cvde.201407115",
language = "English",
volume = "20",
pages = "209--216",
journal = "Chemical Vapor Deposition",
issn = "0948-1907",
publisher = "Wiley-VCH Verlag",
number = "7-9",
}