Atomic Layer Deposition of Zinc Glutarate Thin Films

Leo Daniel Salmi, Miika Juhana Mattinen, Teemu Yrjö Manuel Niemi, Mikko Juhani Heikkilä, Kenichiro Mizohata, Sanna Korhonen, Sami-Pekka Hirvonen, Jyrki Antero Räisänen, Mikko Kalervo Ritala

Research output: Contribution to journalArticleScientificpeer-review

Abstract

Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2
Original languageEnglish
Article number1700512
JournalAdvanced Materials Interfaces
Volume4
Issue number22
Number of pages6
ISSN2196-7350
DOIs
Publication statusPublished - Sep 2017
MoE publication typeA1 Journal article-refereed

Fields of Science

  • 116 Chemical sciences
  • 221 Nano-technology
  • 216 Materials engineering

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