Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone

Kaupo Kukli, Marianna Kemell, Kenichiro Mizohata, Marko Vehkamäki, Kristjan Kalam, Helena Castan, Salvador Duenas, Joosep Link, Raivo Stern, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalECS Journal of Solid State Science and Technology
Volume7
Issue number2
Pages (from-to)P1-P8
Number of pages8
ISSN2162-8769
DOIs
Publication statusPublished - 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • ZRO2 THIN-FILMS
  • ROOM-TEMPERATURE FERROMAGNETISM
  • CYCLOPENTADIENYL PRECURSORS
  • GROWTH TEMPERATURE
  • NANOSTRUCTURES
  • MEMORY
  • SILICON
  • TETRACHLORIDE
  • NANOPARTICLES
  • PRESSURE
  • 116 Chemical sciences
  • 114 Physical sciences

Cite this

@article{10176a717d864fbf8f1a8b08304bdd91,
title = "Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone",
keywords = "ZRO2 THIN-FILMS, ROOM-TEMPERATURE FERROMAGNETISM, CYCLOPENTADIENYL PRECURSORS, GROWTH TEMPERATURE, NANOSTRUCTURES, MEMORY, SILICON, TETRACHLORIDE, NANOPARTICLES, PRESSURE, 116 Chemical sciences, 114 Physical sciences",
author = "Kaupo Kukli and Marianna Kemell and Kenichiro Mizohata and Marko Vehkam{\"a}ki and Kristjan Kalam and Helena Castan and Salvador Duenas and Joosep Link and Raivo Stern and Mikko Ritala and Markku Leskel{\"a}",
year = "2018",
doi = "10.1149/2.0041802jss",
language = "English",
volume = "7",
pages = "P1--P8",
journal = "ECS Journal of Solid State Science and Technology",
issn = "2162-8769",
publisher = "ELECTROCHEMICAL SOC INC",
number = "2",

}

Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone. / Kukli, Kaupo; Kemell, Marianna; Mizohata, Kenichiro; Vehkamäki, Marko; Kalam, Kristjan; Castan, Helena; Duenas, Salvador; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku.

In: ECS Journal of Solid State Science and Technology, Vol. 7, No. 2, 2018, p. P1-P8.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone

AU - Kukli, Kaupo

AU - Kemell, Marianna

AU - Mizohata, Kenichiro

AU - Vehkamäki, Marko

AU - Kalam, Kristjan

AU - Castan, Helena

AU - Duenas, Salvador

AU - Link, Joosep

AU - Stern, Raivo

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2018

Y1 - 2018

KW - ZRO2 THIN-FILMS

KW - ROOM-TEMPERATURE FERROMAGNETISM

KW - CYCLOPENTADIENYL PRECURSORS

KW - GROWTH TEMPERATURE

KW - NANOSTRUCTURES

KW - MEMORY

KW - SILICON

KW - TETRACHLORIDE

KW - NANOPARTICLES

KW - PRESSURE

KW - 116 Chemical sciences

KW - 114 Physical sciences

U2 - 10.1149/2.0041802jss

DO - 10.1149/2.0041802jss

M3 - Article

VL - 7

SP - P1-P8

JO - ECS Journal of Solid State Science and Technology

JF - ECS Journal of Solid State Science and Technology

SN - 2162-8769

IS - 2

ER -