Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors

Anthony C Jones, Paul A Williams, John L Roberts, Timothy J Leedham, Hywel O Davies, Raija Matero, Mikko Ritala, Markku Leskelä

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationMaterials Research Society symposia proceedings
    Place of PublicationNew York, NY
    PublisherNorth-Holland
    Publication date2002
    Pages145-150
    Publication statusPublished - 2002
    MoE publication typeA4 Article in conference proceedings

    Publication series

    NameMaterials Research Society Proceedings
    Volume716

    Fields of Science

    • 116 Chemical sciences

    Cite this

    Jones, A. C., Williams, P. A., Roberts, J. L., Leedham, T. J., Davies, H. O., Matero, R., ... Leskelä, M. (2002). Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors. In Materials Research Society symposia proceedings (pp. 145-150 ). (Materials Research Society Proceedings; Vol. 716). New York, NY : North-Holland.
    Jones, Anthony C ; Williams, Paul A ; Roberts, John L ; Leedham, Timothy J ; Davies, Hywel O ; Matero, Raija ; Ritala, Mikko ; Leskelä, Markku. / Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors. Materials Research Society symposia proceedings . New York, NY : North-Holland, 2002. pp. 145-150 (Materials Research Society Proceedings).
    @inproceedings{b42f2ce52ac84a36bc07e28acd8e8e23,
    title = "Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors",
    keywords = "116 Chemical sciences",
    author = "Jones, {Anthony C} and Williams, {Paul A} and Roberts, {John L} and Leedham, {Timothy J} and Davies, {Hywel O} and Raija Matero and Mikko Ritala and Markku Leskel{\"a}",
    note = "Volume: Proceeding volume:",
    year = "2002",
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    series = "Materials Research Society Proceedings",
    publisher = "North-Holland",
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    booktitle = "Materials Research Society symposia proceedings",
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    Jones, AC, Williams, PA, Roberts, JL, Leedham, TJ, Davies, HO, Matero, R, Ritala, M & Leskelä, M 2002, Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors. in Materials Research Society symposia proceedings . Materials Research Society Proceedings, vol. 716, North-Holland, New York, NY , pp. 145-150 .

    Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors. / Jones, Anthony C; Williams, Paul A; Roberts, John L; Leedham, Timothy J; Davies, Hywel O; Matero, Raija; Ritala, Mikko; Leskelä, Markku.

    Materials Research Society symposia proceedings . New York, NY : North-Holland, 2002. p. 145-150 (Materials Research Society Proceedings; Vol. 716).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    TY - GEN

    T1 - Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors

    AU - Jones, Anthony C

    AU - Williams, Paul A

    AU - Roberts, John L

    AU - Leedham, Timothy J

    AU - Davies, Hywel O

    AU - Matero, Raija

    AU - Ritala, Mikko

    AU - Leskelä, Markku

    N1 - Volume: Proceeding volume:

    PY - 2002

    Y1 - 2002

    KW - 116 Chemical sciences

    M3 - Conference contribution

    T3 - Materials Research Society Proceedings

    SP - 145

    EP - 150

    BT - Materials Research Society symposia proceedings

    PB - North-Holland

    CY - New York, NY

    ER -

    Jones AC, Williams PA, Roberts JL, Leedham TJ, Davies HO, Matero R et al. Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors. In Materials Research Society symposia proceedings . New York, NY : North-Holland. 2002. p. 145-150 . (Materials Research Society Proceedings).