@article{e15f9dd0c1c049f5a64cc800a3bbad7f,
title = "Atomic Layer Etching of Tantalum with NbCl5 and O2",
keywords = "Thin-films, Diffusion-barriers, Copper, Alpha, Beta, Interconnect, Deposition, Cu, 116 Chemical sciences",
author = "Juha Ojala and Pekka Pykalainen and Mykhailo Chundak and Anton Vihervaara and Marko Vehkamaki and Mikko Ritala",
year = "2025",
month = may,
day = "14",
doi = "10.1021/acs.chemmater.5c00593",
language = "English",
volume = "37",
pages = "3822--3829",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "10",
}