Comparison of HfO2 Thin Films Grown by ALD Using Cp2Hf(CH3)2 and Water or Ozone as Precursors

Jaakko Niinistö, Matti Putkonen, Lauri Niinistö

Research output: Book/Report › Commissioned report

Original language	English

Publication status	Published - 2004
Externally published	Yes
MoE publication type	D4 Published development or research report or study

HelsinkiALD
Putkonen, M. (Manager), Ritala, M. (Manager), Mäntymäki, M. (Operator), Kemell, M. (Operator), Vehkamäki, M. (Operator) & Heikkilä, M. (Operator)
Department of Chemistry
Facility/equipment: Research Laboratory

Equipment