Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films

Timothee Blanquart, Mikko Kaipio, Jaakko Niinistö, Marco Gavagnin, Valentino Longo, Laurie Blanquart, Clement Lansalot, W. Noh, Heinz D. Wanzenböck, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalChemical Vapor Deposition
Volume20
Issue number7-9
Pages (from-to)217-223
Number of pages7
ISSN0948-1907
DOIs
Publication statusPublished - Sep 2014
MoE publication typeA1 Journal article-refereed

Fields of Science

  • ALD
  • Er2O3
  • Thin films
  • CHEMICAL-VAPOR-DEPOSITION
  • RARE-EARTH-OXIDES
  • BETA-DIKETONATE
  • DIELECTRICS
  • (CPME)(3)ER
  • OXIDATION
  • COMPLEXES
  • GROWTH
  • OZONE
  • 116 Chemical sciences

Cite this

Blanquart, T., Kaipio, M., Niinistö, J., Gavagnin, M., Longo, V., Blanquart, L., Lansalot, C., Noh, W., Wanzenböck, H. D., Ritala, M., & Leskelä, M. (2014). Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films. Chemical Vapor Deposition, 20(7-9), 217-223. https://doi.org/10.1002/cvde.201407116