Direct laser writing: virtual mask optimization for optical quality control artefact

Miikka Aleksi Järvinen, Gianmario Scotti, Tuomas Vainikka, Edward Haeggström, Ivan Kassamakov

Research output: Chapter in Book/Report/Conference proceedingChapterScientific

Original languageEnglish
Title of host publicationPhotomask technology 2017 : 11-14 September 2017, Monterey, California, United States
EditorsPeter Buck, Emily Gallagher
Number of pages9
Place of PublicationBellingham, Washington
PublisherSPIE
Publication date2017
ISBN (Print)978-1-5106-1376-8
ISBN (Electronic)978-1-5106-1377-5
DOIs
Publication statusPublished - 2017
MoE publication typeB2 Book chapter
Event SPIE Photomask Technology and EUV Lithography - Monterey, California, United States
Duration: 11 Sep 201714 Sep 2017

Publication series

NameProceedings of SPIE
Volume10451
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Fields of Science

  • 114 Physical sciences
  • Scanning white light interferometry (SWLI)
  • Design of the Experiment (DOE)
  • direct laser writing (DLW)
  • micro-electro-mechanical systems (MEMS)
  • WHITE-LIGHT INTER FEROMETRY
  • LITHOGRAPHY
  • DEPTH

Cite this

Järvinen, M. A., Scotti, G., Vainikka, T., Haeggström, E., & Kassamakov, I. (2017). Direct laser writing: virtual mask optimization for optical quality control artefact. In P. Buck, & E. Gallagher (Eds.), Photomask technology 2017: 11-14 September 2017, Monterey, California, United States (Proceedings of SPIE ; Vol. 10451). Bellingham, Washington: SPIE. https://doi.org/10.1117/12.2280547
Järvinen, Miikka Aleksi ; Scotti, Gianmario ; Vainikka, Tuomas ; Haeggström, Edward ; Kassamakov, Ivan . / Direct laser writing : virtual mask optimization for optical quality control artefact. Photomask technology 2017: 11-14 September 2017, Monterey, California, United States . editor / Peter Buck ; Emily Gallagher. Bellingham, Washington : SPIE, 2017. (Proceedings of SPIE ).
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keywords = "114 Physical sciences, Scanning white light interferometry (SWLI), Design of the Experiment (DOE), direct laser writing (DLW), micro-electro-mechanical systems (MEMS), WHITE-LIGHT INTER FEROMETRY, LITHOGRAPHY, DEPTH",
author = "J{\"a}rvinen, {Miikka Aleksi} and Gianmario Scotti and Tuomas Vainikka and Edward Haeggstr{\"o}m and Ivan Kassamakov",
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Järvinen, MA, Scotti, G, Vainikka, T, Haeggström, E & Kassamakov, I 2017, Direct laser writing: virtual mask optimization for optical quality control artefact. in P Buck & E Gallagher (eds), Photomask technology 2017: 11-14 September 2017, Monterey, California, United States . Proceedings of SPIE , vol. 10451, SPIE, Bellingham, Washington, SPIE Photomask Technology and EUV Lithography, Monterey, California, United States, 11/09/2017. https://doi.org/10.1117/12.2280547

Direct laser writing : virtual mask optimization for optical quality control artefact. / Järvinen, Miikka Aleksi; Scotti, Gianmario; Vainikka, Tuomas ; Haeggström, Edward ; Kassamakov, Ivan .

Photomask technology 2017: 11-14 September 2017, Monterey, California, United States . ed. / Peter Buck; Emily Gallagher. Bellingham, Washington : SPIE, 2017. (Proceedings of SPIE ; Vol. 10451).

Research output: Chapter in Book/Report/Conference proceedingChapterScientific

TY - CHAP

T1 - Direct laser writing

T2 - virtual mask optimization for optical quality control artefact

AU - Järvinen, Miikka Aleksi

AU - Scotti, Gianmario

AU - Vainikka, Tuomas

AU - Haeggström, Edward

AU - Kassamakov, Ivan

PY - 2017

Y1 - 2017

KW - 114 Physical sciences

KW - Scanning white light interferometry (SWLI)

KW - Design of the Experiment (DOE)

KW - direct laser writing (DLW)

KW - micro-electro-mechanical systems (MEMS)

KW - WHITE-LIGHT INTER FEROMETRY

KW - LITHOGRAPHY

KW - DEPTH

U2 - 10.1117/12.2280547

DO - 10.1117/12.2280547

M3 - Chapter

SN - 978-1-5106-1376-8

T3 - Proceedings of SPIE

BT - Photomask technology 2017

A2 - Buck, Peter

A2 - Gallagher, Emily

PB - SPIE

CY - Bellingham, Washington

ER -

Järvinen MA, Scotti G, Vainikka T, Haeggström E, Kassamakov I. Direct laser writing: virtual mask optimization for optical quality control artefact. In Buck P, Gallagher E, editors, Photomask technology 2017: 11-14 September 2017, Monterey, California, United States . Bellingham, Washington: SPIE. 2017. (Proceedings of SPIE ). https://doi.org/10.1117/12.2280547