Exploitation of atomic layer deposition for nanostructured materials

Markku Leskelä; Marianna Kemell; Kaupo Kukli; Viljami Pore; Eero Santala; Jun Lu; Mikko Ritala

doi:10.1016/j.msec.2006.06.006

Exploitation of atomic layer deposition for nanostructured materials

Markku Leskelä, Marianna Kemell, Kaupo Kukli, Viljami Pore, Eero Santala, Jun Lu, Mikko Ritala

Research output: Contribution to journal › Review Article › peer-review

Abstract

In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.

Original language	English
Journal	Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems
Volume	27
Pages (from-to)	1504-1508
Number of pages	5
ISSN	0928-4931
DOIs	https://doi.org/10.1016/j.msec.2006.06.006
Publication status	Published - 2007
MoE publication type	A2 Review article in a scientific journal

Fields of Science

116 Chemical sciences
ALD
nanomaterials
nanolaminates
nanofibers
nanotubes
porous materials
thin films

Access to Document

10.1016/j.msec.2006.06.006

Cite this

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title = "Exploitation of atomic layer deposition for nanostructured materials",

abstract = "In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.",

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author = "Markku Leskel{\"a} and Marianna Kemell and Kaupo Kukli and Viljami Pore and Eero Santala and Jun Lu and Mikko Ritala",

year = "2007",

doi = "10.1016/j.msec.2006.06.006",

language = "English",

volume = "27",

pages = "1504--1508",

journal = "Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems",

issn = "0928-4931",

publisher = "Elsevier Scientific Publ. Co",

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TY - JOUR

T1 - Exploitation of atomic layer deposition for nanostructured materials

AU - Leskelä, Markku

AU - Kemell, Marianna

AU - Kukli, Kaupo

AU - Pore, Viljami

AU - Santala, Eero

AU - Lu, Jun

AU - Ritala, Mikko

PY - 2007

Y1 - 2007

N2 - In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.

AB - In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.

KW - 116 Chemical sciences

KW - ALD

KW - nanomaterials

KW - nanolaminates

KW - nanofibers

KW - nanotubes

KW - porous materials

KW - thin films

KW - ALD

KW - nanomaterials

KW - nanolaminates

KW - nanofibers

KW - nanotubes

KW - porous materials

KW - thin films

KW - ALD

KW - nanomaterials

KW - nanolaminates

KW - nanofibers

KW - nanotubes

KW - porous materials

KW - thin films

U2 - 10.1016/j.msec.2006.06.006

DO - 10.1016/j.msec.2006.06.006

M3 - Review Article

VL - 27

SP - 1504

EP - 1508

JO - Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems

JF - Materials Science & Engineering. C, Biomimetic Materials, Sensors and Systems

SN - 0928-4931

ER -