Exploitation of atomic layer deposition for nanostructured materials

Markku Leskelä, Marianna Kemell, Kaupo Kukli, Viljami Pore, Eero Santala, Jun Lu, Mikko Ritala

    Research output: Contribution to journalReview Articlepeer-review


    In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.
    Original languageEnglish
    JournalMaterials Science & Engineering. C, Biomimetic Materials, Sensors and Systems
    Pages (from-to)1504-1508
    Number of pages5
    Publication statusPublished - 2007
    MoE publication typeA2 Review article in a scientific journal

    Fields of Science

    • 116 Chemical sciences
    • ALD
    • nanomaterials
    • nanolaminates
    • nanofibers
    • nanotubes
    • porous materials
    • thin films

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