Exploitation of atomic layer deposition for nanostructured materials

Markku Leskelä, Marianna Kemell, Kaupo Kukli, Viljami Pore, Eero Santala, Jun Lu, Mikko Ritala

Research output: Contribution to journalReview Articlepeer-review

Abstract

In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.
Original languageEnglish
JournalMaterials Science & Engineering. C, Biomimetic Materials, Sensors and Systems
Volume27
Pages (from-to)1504-1508
Number of pages5
ISSN0928-4931
DOIs
Publication statusPublished - 2007
MoE publication typeA2 Review article in a scientific journal

Fields of Science

  • 116 Chemical sciences
  • ALD
  • nanomaterials
  • nanolaminates
  • nanofibers
  • nanotubes
  • porous materials
  • thin films

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