Heteroleptic Precursors for Atomic Layer Deposition

J. Niinisto, T. Blanquart, S. Seppala, M. Ritala, M. Leskela

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationAtomic Layer Deposition Applications 10
EditorsF Roozeboom, S DeGendt, A Delabie, JW Elam, A Londergan, O VanDerStraten
Number of pages12
PublisherELECTROCHEMICAL SOC INC
Publication date2014
Pages221-232
ISBN (Print)978-1-62332-189-5
ISBN (Electronic)978-1-60768-546-3
DOIs
Publication statusPublished - 2014
MoE publication typeA4 Article in conference proceedings
EventInternational Symposium on Atomic Layer Deposition Applications - Cancun, Mexico
Duration: 5 Oct 20149 Oct 2014
Conference number: 10

Publication series

NameECS Transactions
PublisherELECTROCHEMICAL SOC INC
Number9
Volume64
ISSN (Print)1938-5862

Fields of Science

  • OXIDE THIN-FILMS
  • CYCLOPENTADIENYL PRECURSORS
  • WATER
  • GROWTH
  • HAFNIUM
  • ALD
  • 116 Chemical sciences
  • 114 Physical sciences

Cite this

Niinisto, J., Blanquart, T., Seppala, S., Ritala, M., & Leskela, M. (2014). Heteroleptic Precursors for Atomic Layer Deposition. In F. Roozeboom, S. DeGendt, A. Delabie, JW. Elam, A. Londergan, & O. VanDerStraten (Eds.), Atomic Layer Deposition Applications 10 (pp. 221-232). (ECS Transactions; Vol. 64, No. 9). ELECTROCHEMICAL SOC INC. https://doi.org/10.1149/06409.0221ecst
Niinisto, J. ; Blanquart, T. ; Seppala, S. ; Ritala, M. ; Leskela, M. / Heteroleptic Precursors for Atomic Layer Deposition. Atomic Layer Deposition Applications 10. editor / F Roozeboom ; S DeGendt ; A Delabie ; JW Elam ; A Londergan ; O VanDerStraten. ELECTROCHEMICAL SOC INC, 2014. pp. 221-232 (ECS Transactions; 9).
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title = "Heteroleptic Precursors for Atomic Layer Deposition",
keywords = "OXIDE THIN-FILMS, CYCLOPENTADIENYL PRECURSORS, WATER, GROWTH, HAFNIUM, ALD, 116 Chemical sciences, 114 Physical sciences",
author = "J. Niinisto and T. Blanquart and S. Seppala and M. Ritala and M. Leskela",
note = "Volume: Proceeding volume:",
year = "2014",
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publisher = "ELECTROCHEMICAL SOC INC",
number = "9",
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Niinisto, J, Blanquart, T, Seppala, S, Ritala, M & Leskela, M 2014, Heteroleptic Precursors for Atomic Layer Deposition. in F Roozeboom, S DeGendt, A Delabie, JW Elam, A Londergan & O VanDerStraten (eds), Atomic Layer Deposition Applications 10. ECS Transactions, no. 9, vol. 64, ELECTROCHEMICAL SOC INC, pp. 221-232, International Symposium on Atomic Layer Deposition Applications, Cancun, Mexico, 05/10/2014. https://doi.org/10.1149/06409.0221ecst

Heteroleptic Precursors for Atomic Layer Deposition. / Niinisto, J.; Blanquart, T.; Seppala, S.; Ritala, M.; Leskela, M.

Atomic Layer Deposition Applications 10. ed. / F Roozeboom; S DeGendt; A Delabie; JW Elam; A Londergan; O VanDerStraten. ELECTROCHEMICAL SOC INC, 2014. p. 221-232 (ECS Transactions; Vol. 64, No. 9).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

TY - GEN

T1 - Heteroleptic Precursors for Atomic Layer Deposition

AU - Niinisto, J.

AU - Blanquart, T.

AU - Seppala, S.

AU - Ritala, M.

AU - Leskela, M.

N1 - Volume: Proceeding volume:

PY - 2014

Y1 - 2014

KW - OXIDE THIN-FILMS

KW - CYCLOPENTADIENYL PRECURSORS

KW - WATER

KW - GROWTH

KW - HAFNIUM

KW - ALD

KW - 116 Chemical sciences

KW - 114 Physical sciences

U2 - 10.1149/06409.0221ecst

DO - 10.1149/06409.0221ecst

M3 - Conference contribution

SN - 978-1-62332-189-5

T3 - ECS Transactions

SP - 221

EP - 232

BT - Atomic Layer Deposition Applications 10

A2 - Roozeboom, F

A2 - DeGendt, S

A2 - Delabie, A

A2 - Elam, JW

A2 - Londergan, A

A2 - VanDerStraten, O

PB - ELECTROCHEMICAL SOC INC

ER -

Niinisto J, Blanquart T, Seppala S, Ritala M, Leskela M. Heteroleptic Precursors for Atomic Layer Deposition. In Roozeboom F, DeGendt S, Delabie A, Elam JW, Londergan A, VanDerStraten O, editors, Atomic Layer Deposition Applications 10. ELECTROCHEMICAL SOC INC. 2014. p. 221-232. (ECS Transactions; 9). https://doi.org/10.1149/06409.0221ecst