Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materials

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Article number2100014
JournalAdvanced Materials Interfaces
Volume8
Issue number11
Number of pages9
ISSN2196-7350
DOIs
Publication statusPublished - 9 Jun 2021
MoE publication typeA1 Journal article-refereed

Fields of Science

  • area
  • selective deposition
  • atomic layer deposition
  • copper films
  • photo
  • assisted deposition
  • photocatalysis
  • 114 Physical sciences
  • 116 Chemical sciences

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