In Situ Studies on Reaction Mechanisms in Atomic Layer Deposition

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
JournalCritical Reviews in Solid State & Materials Sciences
Volume38
Issue number3
Pages (from-to)167-202
Number of pages36
ISSN1040-8436
DOIs
Publication statusPublished - 1 Jan 2013
MoE publication typeA1 Journal article-refereed

Fields of Science

  • atomic layer deposition
  • reaction mechanism
  • ligand exchange reaction
  • in situ
  • mass spectrometry
  • quartz crystal microbalance
  • infrared spectrometry
  • OXIDE THIN-FILMS
  • QUARTZ-CRYSTAL MICROBALANCE
  • SURFACE-REACTION MECHANISMS
  • BINARY REACTION SEQUENCE
  • TRANSMISSION FTIR SPECTROSCOPY
  • QUADRUPOLE MASS-SPECTROMETRY
  • GAAS GROWTH-PROCESS
  • REFLECTANCE-DIFFERENCE SPECTROSCOPY
  • INSITU OPTICAL CHARACTERIZATION
  • TERMINATED SI(100) SURFACES
  • 116 Chemical sciences
  • 114 Physical sciences

Cite this