In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Heta-Elisa Nieminen; Mykhailo Chundak; Mikko J. Heikkila; Paloma Ruiz Karkkainen; Marko Vehkamaki; Matti Putkonen; Mikko Ritala

doi:10.1116/6.0002312

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Heta-Elisa Nieminen, Mykhailo Chundak, Mikko J. Heikkila, Paloma Ruiz Karkkainen, Marko Vehkamaki, Matti Putkonen, Mikko Ritala

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Article number	022401
Journal	Journal of vacuum science & technology : an official journal of the American Vacuum Society
Volume	41
Issue number	2
Number of pages	11
ISSN	0734-2101
DOIs	https://doi.org/10.1116/6.0002312
Publication status	Published - Mar 2023
MoE publication type	A1 Journal article-refereed

Fields of Science

Ray photoelectron-spectroscopy
Quartz-crystal microbalance
Al2o3 thin-films
Surface-chemistry
Interface formation
Mass-spectrometry
Alumina ald
Situ
Growth
Trimethylaluminum
116 Chemical sciences

Access to Document

10.1116/6.0002312

In vacuo cluster toolFinal published version, 3.36 MBLicence: Unspecified

HelsinkiALD
Putkonen, M. (Manager), Ritala, M. (Manager), Mäntymäki, M. (Operator), Kemell, M. (Operator), Vehkamäki, M. (Operator) & Heikkilä, M. (Operator)
Department of Chemistry
Facility/equipment: Research Laboratory

Cite this

Nieminen, H.-E., Chundak, M., Heikkila, M. J., Karkkainen, P. R., Vehkamaki, M., Putkonen, M., & Ritala, M. (2023). In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes. Journal of vacuum science & technology : an official journal of the American Vacuum Society, 41(2), Article 022401. https://doi.org/10.1116/6.0002312

@article{e5e4a6ccc5c640ea9f3104277d4794e6,

title = "In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes",

keywords = "Ray photoelectron-spectroscopy, Quartz-crystal microbalance, Al2o3 thin-films, Surface-chemistry, Interface formation, Mass-spectrometry, Alumina ald, Situ, Growth, Trimethylaluminum, 116 Chemical sciences",

author = "Heta-Elisa Nieminen and Mykhailo Chundak and Heikkila, {Mikko J.} and Karkkainen, {Paloma Ruiz} and Marko Vehkamaki and Matti Putkonen and Mikko Ritala",

year = "2023",

month = mar,

doi = "10.1116/6.0002312",

language = "English",

volume = "41",

journal = "Journal of vacuum science & technology : an official journal of the American Vacuum Society",

issn = "0734-2101",

publisher = "AVS",

number = "2",

}

Nieminen, H-E , Chundak, M , Heikkila, MJ , Karkkainen, PR , Vehkamaki, M , Putkonen, M & Ritala, M 2023, 'In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes', Journal of vacuum science & technology : an official journal of the American Vacuum Society, vol. 41, no. 2, 022401. https://doi.org/10.1116/6.0002312

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes. / Nieminen, Heta-Elisa ; Chundak, Mykhailo ; Heikkila, Mikko J. et al.
In: Journal of vacuum science & technology : an official journal of the American Vacuum Society, Vol. 41, No. 2, 022401, 03.2023.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

AU - Nieminen, Heta-Elisa

AU - Chundak, Mykhailo

AU - Heikkila, Mikko J.

AU - Karkkainen, Paloma Ruiz

AU - Vehkamaki, Marko

AU - Putkonen, Matti

AU - Ritala, Mikko

PY - 2023/3

Y1 - 2023/3

KW - Ray photoelectron-spectroscopy

KW - Quartz-crystal microbalance

KW - Al2o3 thin-films

KW - Surface-chemistry

KW - Interface formation

KW - Mass-spectrometry

KW - Alumina ald

KW - Situ

KW - Growth

KW - Trimethylaluminum

KW - 116 Chemical sciences

U2 - 10.1116/6.0002312

DO - 10.1116/6.0002312

M3 - Article

SN - 0734-2101

VL - 41

JO - Journal of vacuum science & technology : an official journal of the American Vacuum Society

JF - Journal of vacuum science & technology : an official journal of the American Vacuum Society

IS - 2

M1 - 022401

ER -

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes

Fields of Science

Access to Document

Equipment

HelsinkiALD

Cite this