Inherent surface roughening as a limiting factor in epitaxial cluster deposition

Kristoffer Meinander, Kai Nordlund, Juhani Keinonen

    Research output: Contribution to journalConference articleScientificpeer-review

    Abstract

    Deposition of nanoclusters at thermal energies will result in an onset of roughening of the deposited surface. In order to grow epitaxial films using cluster deposition at soft landing conditions, the effect of this inherent surface roughness on the alignment of deposited clusters must be investigated. Using molecular dynamics computer simulations we have determined the maximum size of Cu clusters that will align epitaxially, upon deposition at thermal energies, on rough (100) Cu substrates with temperatures ranging from OK to 750K. We have also shown that the likelihood of epitaxial alignment for the resulting structures is dependent on the point of impact of a cluster relative to previously deposited clusters. (C) 2004 Elsevier B.V. All rights reserved.
    Original languageEnglish
    JournalNuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
    Volume228
    Issue number1-4
    Pages (from-to)69-74
    Number of pages6
    ISSN0168-583X
    DOIs
    Publication statusPublished - 2005
    MoE publication typeA4 Article in conference proceedings
    EventUnknown host publication - , Netherlands
    Duration: 1 Jan 1800 → …

    Cite this

    @article{8cbac8e8f7f342da8620d79e5befeeb2,
    title = "Inherent surface roughening as a limiting factor in epitaxial cluster deposition",
    abstract = "Deposition of nanoclusters at thermal energies will result in an onset of roughening of the deposited surface. In order to grow epitaxial films using cluster deposition at soft landing conditions, the effect of this inherent surface roughness on the alignment of deposited clusters must be investigated. Using molecular dynamics computer simulations we have determined the maximum size of Cu clusters that will align epitaxially, upon deposition at thermal energies, on rough (100) Cu substrates with temperatures ranging from OK to 750K. We have also shown that the likelihood of epitaxial alignment for the resulting structures is dependent on the point of impact of a cluster relative to previously deposited clusters. (C) 2004 Elsevier B.V. All rights reserved.",
    author = "Kristoffer Meinander and Kai Nordlund and Juhani Keinonen",
    note = "Volume: 228 Host publication title: Seventh International Conference on Computer Simulation of Radiation Effects in Solids Proceeding volume:",
    year = "2005",
    doi = "10.1016/j.nimb.2004.10.025",
    language = "English",
    volume = "228",
    pages = "69--74",
    journal = "Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms",
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    publisher = "Elsevier",
    number = "1-4",

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    Inherent surface roughening as a limiting factor in epitaxial cluster deposition. / Meinander, Kristoffer; Nordlund, Kai; Keinonen, Juhani.

    In: Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, Vol. 228, No. 1-4, 2005, p. 69-74.

    Research output: Contribution to journalConference articleScientificpeer-review

    TY - JOUR

    T1 - Inherent surface roughening as a limiting factor in epitaxial cluster deposition

    AU - Meinander, Kristoffer

    AU - Nordlund, Kai

    AU - Keinonen, Juhani

    N1 - Volume: 228 Host publication title: Seventh International Conference on Computer Simulation of Radiation Effects in Solids Proceeding volume:

    PY - 2005

    Y1 - 2005

    N2 - Deposition of nanoclusters at thermal energies will result in an onset of roughening of the deposited surface. In order to grow epitaxial films using cluster deposition at soft landing conditions, the effect of this inherent surface roughness on the alignment of deposited clusters must be investigated. Using molecular dynamics computer simulations we have determined the maximum size of Cu clusters that will align epitaxially, upon deposition at thermal energies, on rough (100) Cu substrates with temperatures ranging from OK to 750K. We have also shown that the likelihood of epitaxial alignment for the resulting structures is dependent on the point of impact of a cluster relative to previously deposited clusters. (C) 2004 Elsevier B.V. All rights reserved.

    AB - Deposition of nanoclusters at thermal energies will result in an onset of roughening of the deposited surface. In order to grow epitaxial films using cluster deposition at soft landing conditions, the effect of this inherent surface roughness on the alignment of deposited clusters must be investigated. Using molecular dynamics computer simulations we have determined the maximum size of Cu clusters that will align epitaxially, upon deposition at thermal energies, on rough (100) Cu substrates with temperatures ranging from OK to 750K. We have also shown that the likelihood of epitaxial alignment for the resulting structures is dependent on the point of impact of a cluster relative to previously deposited clusters. (C) 2004 Elsevier B.V. All rights reserved.

    U2 - 10.1016/j.nimb.2004.10.025

    DO - 10.1016/j.nimb.2004.10.025

    M3 - Conference article

    VL - 228

    SP - 69

    EP - 74

    JO - Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

    JF - Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

    SN - 0168-583X

    IS - 1-4

    ER -