Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films

Miika Mattinen, Peter J. King, Leonid Khriachtchev, Kristoffer Meinander, James T. Gibbon, Vin R. Dhanak, Jyrki Räisänen, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Article number1800547
JournalSmall
Volume14
Issue number21
Number of pages8
ISSN1613-6810
DOIs
Publication statusPublished - 24 May 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • 2d materials
  • atomic layer deposition
  • semiconductors
  • SnS2
  • thin films
  • CHEMICAL-VAPOR-DEPOSITION
  • TRANSITION-METAL DICHALCOGENIDES
  • ATOMIC LAYER DEPOSITION
  • SINGLE-CRYSTAL SNS2
  • MOLYBDENUM-DISULFIDE
  • GROWTH
  • TRANSISTORS
  • NANOSHEETS
  • MOS2
  • 116 Chemical sciences
  • 114 Physical sciences
  • 221 Nano-technology

Cite this

Mattinen, M., King, P. J., Khriachtchev, L., Meinander, K., Gibbon, J. T., Dhanak, V. R., ... Leskelä, M. (2018). Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films. Small, 14(21), [1800547]. https://doi.org/10.1002/smll.201800547
Mattinen, Miika ; King, Peter J. ; Khriachtchev, Leonid ; Meinander, Kristoffer ; Gibbon, James T. ; Dhanak, Vin R. ; Räisänen, Jyrki ; Ritala, Mikko ; Leskelä, Markku. / Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films. In: Small. 2018 ; Vol. 14, No. 21.
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title = "Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films",
keywords = "2d materials, atomic layer deposition, semiconductors, SnS2, thin films, CHEMICAL-VAPOR-DEPOSITION, TRANSITION-METAL DICHALCOGENIDES, ATOMIC LAYER DEPOSITION, SINGLE-CRYSTAL SNS2, MOLYBDENUM-DISULFIDE, GROWTH, TRANSISTORS, NANOSHEETS, MOS2, 116 Chemical sciences, 114 Physical sciences, 221 Nano-technology",
author = "Miika Mattinen and King, {Peter J.} and Leonid Khriachtchev and Kristoffer Meinander and Gibbon, {James T.} and Dhanak, {Vin R.} and Jyrki R{\"a}is{\"a}nen and Mikko Ritala and Markku Leskel{\"a}",
year = "2018",
month = "5",
day = "24",
doi = "10.1002/smll.201800547",
language = "English",
volume = "14",
journal = "Small",
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Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films. / Mattinen, Miika; King, Peter J.; Khriachtchev, Leonid; Meinander, Kristoffer; Gibbon, James T.; Dhanak, Vin R.; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku.

In: Small, Vol. 14, No. 21, 1800547, 24.05.2018.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films

AU - Mattinen, Miika

AU - King, Peter J.

AU - Khriachtchev, Leonid

AU - Meinander, Kristoffer

AU - Gibbon, James T.

AU - Dhanak, Vin R.

AU - Räisänen, Jyrki

AU - Ritala, Mikko

AU - Leskelä, Markku

PY - 2018/5/24

Y1 - 2018/5/24

KW - 2d materials

KW - atomic layer deposition

KW - semiconductors

KW - SnS2

KW - thin films

KW - CHEMICAL-VAPOR-DEPOSITION

KW - TRANSITION-METAL DICHALCOGENIDES

KW - ATOMIC LAYER DEPOSITION

KW - SINGLE-CRYSTAL SNS2

KW - MOLYBDENUM-DISULFIDE

KW - GROWTH

KW - TRANSISTORS

KW - NANOSHEETS

KW - MOS2

KW - 116 Chemical sciences

KW - 114 Physical sciences

KW - 221 Nano-technology

U2 - 10.1002/smll.201800547

DO - 10.1002/smll.201800547

M3 - Article

VL - 14

JO - Small

JF - Small

SN - 1613-6810

IS - 21

M1 - 1800547

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Mattinen M, King PJ, Khriachtchev L, Meinander K, Gibbon JT, Dhanak VR et al. Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films. Small. 2018 May 24;14(21). 1800547. https://doi.org/10.1002/smll.201800547