Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films

Miika Mattinen, Peter J. King, Leonid Khriachtchev, Kristoffer Meinander, James T. Gibbon, Vin R. Dhanak, Jyrki Räisänen, Mikko Ritala, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Article number1800547
JournalSmall
Volume14
Issue number21
Number of pages8
ISSN1613-6810
DOIs
Publication statusPublished - 24 May 2018
MoE publication typeA1 Journal article-refereed

Fields of Science

  • 2d materials
  • atomic layer deposition
  • semiconductors
  • SnS2
  • thin films
  • CHEMICAL-VAPOR-DEPOSITION
  • TRANSITION-METAL DICHALCOGENIDES
  • ATOMIC LAYER DEPOSITION
  • SINGLE-CRYSTAL SNS2
  • MOLYBDENUM-DISULFIDE
  • GROWTH
  • TRANSISTORS
  • NANOSHEETS
  • MOS2
  • 116 Chemical sciences
  • 114 Physical sciences
  • 221 Nano-technology

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