On the Interface Quality of MIS Structures Fabricated from Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5-Ta2O5-Nb2O5 Dielectric Thin Films

Salvador Dueñas, Helena Castán, Héctor Garcia, Juan Barbolla, Kaupo Kukli, Mikko Ritala, Markku Leskelä

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Number of pages6
Publication date2004
Pages147
DOIs
Publication statusPublished - 2004
MoE publication typeA4 Article in conference proceedings

Publication series

NameMaterials Research Society Online Proceedings Library
Volume786

Fields of Science

  • 116 Chemical sciences

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