@article{c4567d929610473e8745f03694daef7e,
title = "Phase separation and Si nanocrystal formation in bulk SiO studied by x-ray scattering",
keywords = "annealing, crystal microstructure, elemental semiconductors, nanostructured materials, phase separation, silicon, silicon compounds, X-ray scattering, AMORPHOUS-SILICON MONOXIDE, SMALL-ANGLE, 114 Physical sciences",
author = "O.M. Feroughi and C. Sternemann and C. Sahle and M.A. Schroer and H. Sternemann and H. Conrad and A. Hohl and G.T. Seidler and J. Bradley and T.T. Fister and M. Balasubramanian and A. Sakko and K. Pirkkalainen and K. H{\"a}m{\"a}l{\"a}inen and M. Tolan",
year = "2010",
doi = "10.1063/1.3323106",
language = "English",
volume = "96",
pages = "081912",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
}