Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors

J. Blasco, H. Castan, H. Garcia, S. Duenas, J. Sune, M. Kemell, K. Kukli, M. Ritala, M. Leskelä, E. Miranda

Research output: Contribution to journalConference articleScientificpeer-review

Original languageEnglish
JournalMicroelectronics Reliability
Volume54
Issue number9-10
Pages (from-to)1707-1711
Number of pages5
ISSN0026-2714
DOIs
Publication statusPublished - 2014
MoE publication typeA4 Article in conference proceedings
EventEuropean Symposium on the Reliability of Electron Devices, Failure Physics and Analysis (ESREF) - Berlin, Germany
Duration: 29 Sept 20142 Oct 2014
Conference number: 25

Fields of Science

  • Breakdown
  • Reliability
  • High-kappa
  • Resistive switching
  • SOFT BREAKDOWN
  • DIODE EQUATION
  • GATE OXIDES
  • TEMPERATURE
  • DEVICES
  • SILICON
  • LAYERS
  • 116 Chemical sciences
  • 114 Physical sciences

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