@article{4ec3d68f7ac94d0e80b230de8dab0560,
title = "Atomic layer CVD in the Bi-Ti-O system",
keywords = "atomic layer CVD, atomic layer epitaxy, bismuth titanate, Bi-Ti-O system, thin films, CHEMICAL-VAPOR-DEPOSITION, BI4TI3O12 THIN-FILMS, BISMUTH TITANATE, DIELECTRIC-PROPERTIES, GROWTH, EPITAXY, 116 Chemical sciences",
author = "Mikael Schuisky and Kaupo Kukli and Mikko Ritala and Anders H{\aa}rsta and Markku Leskela",
year = "2000",
language = "English",
volume = "6",
pages = "139--145",
journal = "Chemical Vapor Deposition",
issn = "0948-1907",
publisher = "Wiley-VCH Verlag",
number = "3",
}