Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminates

Julkaisun otsikon käännös: Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminates: Special Section: Romanian Conference on Advanced Materials 2009

Aile Tamm, Mikko Heikkilä, Marianna Kemell, Jekaterina Kozlova, Kaupo Kukli, Väino Sammelselg, Mikko Ritala, Markku Leskelä

Tutkimustuotos: ArtikkelijulkaisuArtikkeliTieteellinenvertaisarvioitu

Abstrakti

ZrO2 and Er2O3 thin films and nanolaminates were grown by atomic layer deposition from tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium, bis(methylcyclopentadienyl)methoxymethylzirconium and ozone as precursors at 350 °C. Nanolaminates consisted of 3-8 nm thick ZrO2 and Er2O3 layers alternately deposited on planar substrates and on three-dimensional substrates with aspect ratio 1:20. The erbium content was 5-15 at.%. ZrO2-Er2O3 films crystallized already in as-deposited states. Upon annealing at 650 °C, the films were stabilized in the form of cubic or tetragonal ZrO2 polymorph and cubic Er2O3. Dielectric properties of the nanolaminates were comparable to those of the constituent oxides.
Julkaisun otsikon käännösAtomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminates: Special Section: Romanian Conference on Advanced Materials 2009
Alkuperäiskielienglanti
LehtiThin Solid Films
Vuosikerta519
Numero2
Sivut666-673
Sivumäärä8
ISSN0040-6090
DOI - pysyväislinkit
TilaJulkaistu - 2010
OKM-julkaisutyyppiA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä, vertaisarvioitu

Tieteenalat

  • atomic layer deposition
  • x-ray scattering
  • diffraction and reflection
  • crystallization
  • Electrical transport (conductivity, resistivity, mobility, etc.)
  • Rare earth metals
  • oxides
  • Thin film structures
  • insulating films
  • 116 Kemia

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