Atomic Layer Deposition of Zinc Glutarate Thin Films

Leo Daniel Salmi; Miika Juhana Mattinen; Teemu Yrjö Manuel Niemi; Mikko Juhani Heikkilä; Kenichiro Mizohata; Sanna Korhonen; Sami-Pekka Hirvonen; Jyrki Antero Räisänen; Mikko Kalervo Ritala

doi:10.1002/admi.201700512

Atomic Layer Deposition of Zinc Glutarate Thin Films

Leo Daniel Salmi, Miika Juhana Mattinen, Teemu Yrjö Manuel Niemi, Mikko Juhani Heikkilä, Kenichiro Mizohata, Sanna Korhonen, Sami-Pekka Hirvonen, Jyrki Antero Räisänen, Mikko Kalervo Ritala

Tutkimustuotos: Artikkelijulkaisu › Artikkeli › Tieteellinen › vertaisarvioitu

Abstrakti

Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2

Alkuperäiskieli	englanti
Artikkeli	1700512
Lehti	Advanced Materials Interfaces
Vuosikerta	4
Numero	22
Sivumäärä	6
ISSN	2196-7350
DOI - pysyväislinkit	https://doi.org/10.1002/admi.201700512
Tila	Julkaistu - syyskuuta 2017
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä, vertaisarvioitu

Tieteenalat

116 Kemia
221 Nanoteknologia
216 Materiaalitekniikka

Pääsy asiakirjaan

10.1002/admi.201700512

Siteeraa tätä

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title = "Atomic Layer Deposition of Zinc Glutarate Thin Films",

abstract = "Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2",

keywords = "116 Chemical sciences, 221 Nano-technology, 216 Materials engineering",

author = "Salmi, {Leo Daniel} and Mattinen, {Miika Juhana} and Niemi, {Teemu Yrj{\"o} Manuel} and Heikkil{\"a}, {Mikko Juhani} and Kenichiro Mizohata and Sanna Korhonen and Sami-Pekka Hirvonen and R{\"a}is{\"a}nen, {Jyrki Antero} and Ritala, {Mikko Kalervo}",

year = "2017",

month = sep,

doi = "10.1002/admi.201700512",

language = "English",

volume = "4",

journal = "Advanced Materials Interfaces ",

issn = "2196-7350",

publisher = "Wiley",

number = "22",

}

Atomic Layer Deposition of Zinc Glutarate Thin Films. / Salmi, Leo Daniel; Mattinen, Miika Juhana; Niemi, Teemu Yrjö Manuel; Heikkilä, Mikko Juhani ; Mizohata, Kenichiro; Korhonen, Sanna; Hirvonen, Sami-Pekka ; Räisänen, Jyrki Antero ; Ritala, Mikko Kalervo.

julkaisussa: Advanced Materials Interfaces , Vuosikerta 4, Nro 22, 1700512 , 09.2017.

Tutkimustuotos: Artikkelijulkaisu › Artikkeli › Tieteellinen › vertaisarvioitu

TY - JOUR

T1 - Atomic Layer Deposition of Zinc Glutarate Thin Films

AU - Salmi, Leo Daniel

AU - Mattinen, Miika Juhana

AU - Niemi, Teemu Yrjö Manuel

AU - Heikkilä, Mikko Juhani

AU - Mizohata, Kenichiro

AU - Korhonen, Sanna

AU - Hirvonen, Sami-Pekka

AU - Räisänen, Jyrki Antero

AU - Ritala, Mikko Kalervo

PY - 2017/9

Y1 - 2017/9

N2 - Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2

AB - Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2

KW - 116 Chemical sciences

KW - 221 Nano-technology

KW - 216 Materials engineering

U2 - 10.1002/admi.201700512

DO - 10.1002/admi.201700512

M3 - Article

VL - 4

JO - Advanced Materials Interfaces

JF - Advanced Materials Interfaces

SN - 2196-7350

IS - 22

M1 - 1700512

ER -