Synthesis of thin films and coatings by high power impulse magnetron sputtering

Surface engineering by the addition of thin films and coatings are used in a wide range of technological applications, including surface protection of metal cutting and forming tools, optical devices, and microelectronics. The functionality of thin films and coatings crucially depends on their physical attributes, which are in turn governed by the film morphology and phase composition. By generating ample amounts of ionized film-forming species, HiPIMS represents an effective way of controlling film growth and thereby opens the way to tune material properties. In this chapter we use the fundamental discharge physics discussed in the previous chapters to show how the HiPIMS process parameters can be adjusted to control film growth and thereby tune film properties including hardness, refractive index, and residual stress. Several industrially relevant material systems are covered.