Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

Press/media: !!Press / Media

Period	6 sep. 2018

Mediabevakning

Titel	Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates
Medianamn/-företag	ECS Journal of Solid State Science and Technology
Land/Territorium	Förenta Staterna (USA)
Datum	06/09/2018
Webbadress	jss.ecsdl.org/cgi/content/short/7/9/P501?rss=1
Personer	Mikko Ritala, Markku Leskelä, Marianna Kemell