@article{844ef58dfdd4462c866b6f23c897af75,
title = "Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applications",
keywords = "aluminium compounds, atomic layer deposition, interference filters, optical multilayers, refractive index, thin films, 116 Chemical sciences",
author = "Jani H{\"a}m{\"a}l{\"a}inen and Jarkko Ihanus and Timo Sajavaara and Mikko Ritala and Markku Leskel{\"a}",
year = "2011",
doi = "10.1149/1.3519497",
language = "English",
volume = "158",
pages = "P15--P21",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "ELECTROCHEMICAL SOC INC",
number = "2",
}