Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Miika Mattinen; Georgi Popov; Marko Vehkamäki; Peter J. King; Kenichiro Mizohata; Pasi Jalkanen; Jyrki Räisänen; Markku Leskelä; Mikko Ritala

doi:10.1021/acs.chemmater.9b01688

Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Miika Mattinen, Georgi Popov, Marko Vehkamäki, Peter J. King, Kenichiro Mizohata, Pasi Jalkanen, Jyrki Räisänen, Markku Leskelä, Mikko Ritala

Forskningsoutput: Tidskriftsbidrag › Artikel › Vetenskaplig › Peer review

Originalspråk	engelska
Tidskrift	Chemistry of Materials
Volym	31
Nummer	15
Sidor (från-till)	5713-5724
Antal sidor	12
ISSN	0897-4756
DOI	https://doi.org/10.1021/acs.chemmater.9b01688
Status	Publicerad - 13 aug. 2019
MoE-publikationstyp	A1 Tidskriftsartikel-refererad

Vetenskapsgrenar

116 Kemi

Åtkomst av dokument

10.1021/acs.chemmater.9b01688

acs.chemmater.9b01688Slutlig publicerad version, 4,13 MBLicens: CC BY

Citera det här

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title = "Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics",

keywords = "OXIDE THIN-FILMS, TRANSISTORS, CARBON, 116 Chemical sciences",

author = "Miika Mattinen and Georgi Popov and Marko Vehkam{\"a}ki and King, {Peter J.} and Kenichiro Mizohata and Pasi Jalkanen and Jyrki R{\"a}is{\"a}nen and Markku Leskel{\"a} and Mikko Ritala",

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T1 - Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

AU - Mattinen, Miika

AU - Popov, Georgi

AU - Vehkamäki, Marko

AU - King, Peter J.

AU - Mizohata, Kenichiro

AU - Jalkanen, Pasi

AU - Räisänen, Jyrki

AU - Leskelä, Markku

AU - Ritala, Mikko

PY - 2019/8/13

Y1 - 2019/8/13

KW - OXIDE THIN-FILMS

KW - TRANSISTORS

KW - CARBON

KW - 116 Chemical sciences

U2 - 10.1021/acs.chemmater.9b01688

DO - 10.1021/acs.chemmater.9b01688

M3 - Article

VL - 31

SP - 5713

EP - 5724

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 15

ER -