@article{f214ff27966340beb0a2836119c37176,
title = "Atomic layer deposition of high-permittivity yttrium-doped HfO₂ films",
keywords = "116 Chemical sciences",
author = "Jaakko Niinist{\"o} and Kaupo Kukli and Timo Sajavaara and Mikko Ritala and Markku Leskel{\"a} and Lars Oberbeck and Jonas Sundqvist and Uwe Schr{\"o}der",
year = "2009",
language = "English",
volume = "12",
pages = "G1--G4",
journal = "Electrochemical and Solid-State Letters",
issn = "1099-0062",
publisher = "Electrochemical Society Inc.",
number = "1",
}