Atomic Layer Deposition of Zinc Glutarate Thin Films

Leo Daniel Salmi, Miika Juhana Mattinen, Teemu Yrjö Manuel Niemi, Mikko Juhani Heikkilä, Kenichiro Mizohata, Sanna Korhonen, Sami-Pekka Hirvonen, Jyrki Antero Räisänen, Mikko Kalervo Ritala

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Sammanfattning

Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2
Originalspråkengelska
Artikelnummer1700512
TidskriftAdvanced Materials Interfaces
Volym4
Utgåva22
Antal sidor6
ISSN2196-7350
DOI
StatusPublicerad - sep 2017
MoE-publikationstypA1 Tidskriftsartikel-refererad

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  • 116 Kemi
  • 221 Nanoteknologi
  • 216 Materialteknik

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